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NTD3055L170-1G

Onsemi

NTD3055L170-1G by Onsemi

NTD3055L170-1G by Onsemi is a Power FET with 60V DS Breakdown Voltage, 27A IDM, and 0.17 ohm RDS(on). Ideal for switching applications, it features an N-CHANNEL configuration in a RECTANGULAR package with 3 terminals. Operating in ENHANCEMENT MODE, it has a max power dissipation of 1.5W at 175 °C.

Median Price

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Lifecycle Status

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4

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1k+

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Chip Stock

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Vyrian

USA . 9,544 parts In-Stock

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Digiode

USA . 682 parts In-Stock

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NAC Semi

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AZTECH Wire

Italy . 586 parts In-Stock

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$18.340

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Authorized Procurement Solutions

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Problanco Electronics

Mexico . 6,829 parts In-Stock

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TANS Electronics

Latvia . 6,713 parts In-Stock

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Kulean Microsystems

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QUARKTWIN TECHNOLOGY LTD

USA . 4,611 parts In-Stock

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SupplyDigital Components

Austria . 2,807 parts In-Stock

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Kepictronics

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Corphita

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UHIMA Technologies

Türkiye . 597 parts In-Stock

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Overview

Discover the power and reliability of the NTD3055L170-1G by Onsemi, a top-tier manufacturer known for its quality products. This N-channel Power FET is perfect for switching applications, offering a maximum drain current of 9A and a low on-resistance of 0.17 ohm. With a built-in diode, this transistor provides seamless functionality and enhanced performance. Ideal for a wide range of industries, this product guarantees efficiency and durability, making it a valuable choice for all your electronic needs. Upgrade your projects with the NTD3055L170-1G and experience the difference today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components of the transistor, ensuring a longer lifespan.

Polarity or Channel Type: N-CHANNEL

Allows for efficient switching operations in various electronic circuits.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies the circuit design and saves space with the built-in diode.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring reliable performance in such scenarios.

Minimum DS Breakdown Voltage: 60 V

Can handle higher voltage levels without breakdown, making it suitable for a variety of applications.

Terminal Form: THROUGH-HOLE

Easy to solder onto a circuit board, providing a secure connection.

Operating Mode: ENHANCEMENT MODE

Provides better control over the flow of current, enhancing the efficiency of the transistor.

Maximum Pulsed Drain Current (IDM): 27 A

Capable of handling high current pulses, suitable for demanding applications.

Avalanche Energy Rating (EAS): 30 mJ

Can withstand avalanche energy, ensuring reliability in harsh operating conditions.

Maximum Drain Current (Abs) (ID): 9 A

Can handle high continuous drain currents, suitable for power applications.

Maximum Power Dissipation (Abs): 1.5 W

Efficient power dissipation, reducing the risk of overheating during operation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizes MOSFET technology for improved performance and efficiency in switching applications.

Maximum Operating Temperature: 175 °C

Can withstand high operating temperatures, suitable for rugged environments.

Transistor Element Material: SILICON

Provides reliable and consistent performance over time, ensuring longevity.

Terminal Finish: TIN

Provides a good electrical connection and prevents oxidation, ensuring optimal performance.

Maximum Drain-Source On Resistance: 0.17 ohm

Low on-resistance leads to minimal power loss and higher efficiency in switching operations.

Case Connection: DRAIN

Easy to connect to the circuit, simplifying the overall design.

Peak Reflow Temperature °C: 260

Can withstand high reflow temperatures during the manufacturing process, ensuring reliability.

Technical Specifications

Power Field Effect Transistors (FET) NTD3055L170-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

30 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

9 A

Maximum Drain Current (ID):

9 A

Maximum Drain-Source On Resistance:

.17 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

27 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD3055L170-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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