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NTD3055-094-1G

Onsemi

NTD3055-094-1G by Onsemi

NTD3055-094-1G by Onsemi is a Power FET with 60V DS Breakdown Voltage, 45A IDM, and 0.094 ohm RDS. It is an N-CHANNEL transistor for SWITCHING applications. The package is RECTANGULAR with THROUGH-HOLE terminals, operating in ENHANCEMENT MODE up to 175 °C.

Median Price

$0.230

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 101,456 parts In-Stock

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$0.230

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$0.230

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$0.220

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101,456

$0.230

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Digiode

USA . 1,385 parts In-Stock

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$0.218

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Vyrian

USA . 5,814 parts In-Stock

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Semi Source

USA . 249 parts In-Stock

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Corphita

USA . 2,156 parts In-Stock

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$0.207

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Corohmni

South Africa . 351 parts In-Stock

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$0.230

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AZTECH Wire

Italy . 948 parts In-Stock

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$11.510

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948

$11.510

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Component Stockers USA

USA . 458 parts In-Stock

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$99.990

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Perfect Parts

USA . 27,662 parts In-Stock

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Kepictronics

USA . 10,380 parts In-Stock

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Authorized Procurement Solutions

USA . 8,000 parts In-Stock

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Problanco Electronics

Mexico . 7,446 parts In-Stock

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TANS Electronics

Latvia . 7,095 parts In-Stock

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Kulean Microsystems

USA . 4,169 parts In-Stock

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SupplyDigital Components

Austria . 3,920 parts In-Stock

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UHIMA Technologies

Türkiye . 652 parts In-Stock

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Overview

Discover the power and reliability of the NTD3055-094-1G by Onsemi, a top-tier manufacturer of high-quality Power Field Effect Transistors. Ideal for switching applications, this N-channel transistor offers exceptional performance and efficiency. With a built-in diode and a maximum drain-source on resistance of 0.094 ohm, this transistor provides unmatched value and benefits for your projects. Trust Onsemi for superior quality and innovation in electronic components.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation and protection, making the FET more durable and reliable.

Polarity or Channel Type: N-CHANNEL

N-channel FETs often have lower on-state resistance and higher switching speeds, making them efficient for switching applications.

Minimum DS Breakdown Voltage: 60 V

The high breakdown voltage ensures the FET can handle high voltage applications without failure.

Maximum Pulsed Drain Current (IDM): 45 A

With high pulsed drain current, this FET can handle large transient currents effectively.

Maximum Drain Current (ID): 12 A

This high drain current rating allows the FET to handle high continuous currents without overheating.

Maximum Power Dissipation (Abs): 1.5 W

The low power dissipation ensures the FET operates efficiently without excessive heat generation.

Maximum Operating Temperature: 175 °C

The high operating temperature range allows the FET to function in various harsh environments.

Maximum Drain-Source On Resistance: 0.094 ohm

The low on-resistance results in lower power losses and higher efficiency in switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD3055-094-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

61 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.094 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

45 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD3055-094-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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