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NTD3055L104G

Onsemi

NTD3055L104G by Onsemi

NTD3055L104G by Onsemi is an N-channel power FET with a 60V DS breakdown voltage and 45A max pulsed drain current. Ideal for switching applications, it features a built-in diode, 0.104 ohm max RDS(on), and operates in enhancement mode. Suitable for surface mount designs with a small outline package style.

Median Price

$0.306

Lifecycle Status

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13

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1k+

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Nova Conductors

Japan . 10 parts In-Stock

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ComSIT Distribution GmbH

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Digiode

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Corel Iberica Componentes, S.L.

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Sensible Micro Corp

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Sea View Technologies

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Bristol Electronics

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Semi Source

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MISTER SPROCKETS

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Prism Electronics

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GSS - Global Semi Support

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Corohmni

South Africa . 288 parts In-Stock

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Continental Prestige Electronics

USA . 3,931 parts In-Stock

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Argo Parts USA

USA . 2,106 parts In-Stock

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$0.297

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Bastille Electronics

Australia . 200 parts In-Stock

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$0.306

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$0.291

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$0.276

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Aztec Data Supply Inc.

USA . 2,426 parts In-Stock

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Benley Electronics

USA . 20 parts In-Stock

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AZTECH Wire

Italy . 246 parts In-Stock

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Ampacity Inc.

Singapore . 1,481 parts In-Stock

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Semicontronic

India . 897 parts In-Stock

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Authorized Procurement Solutions

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SupplyDigital Components

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Kulean Microsystems

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Overview

Enhance your electronic devices with the high-quality NTD3055L104G power field effect transistor by Onsemi. Manufactured with precision and reliability in mind, this N-channel transistor is perfect for switching applications. With a built-in diode, it offers seamless functionality while maximizing efficiency. Its small outline package ensures easy integration, making it ideal for a wide range of projects. Trust Onsemi to deliver top-notch performance and durability with the NTD3055L104G, providing you with the value and benefits you need to take your designs to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the internal components of the FET, ensuring reliability and longevity.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode improves efficiency and simplifies circuit design by eliminating the need for an external diode component.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast and efficient operation in high-frequency circuits.

Minimum DS Breakdown Voltage: 60 V

With a high breakdown voltage, this FET can handle higher voltage levels without damage, making it suitable for various power applications.

Maximum Pulsed Drain Current (IDM): 45 A

Capable of handling high peak currents, this FET is ideal for applications that require quick bursts of power.

Maximum Power Dissipation (Abs): 48 W

With a high power dissipation rating, this FET can effectively dissipate heat generated during operation, ensuring stable performance.

Maximum Operating Temperature: 175 °C

Designed to operate at high temperatures, this FET can be used in harsh environments without compromising its performance.

Technical Specifications

Power Field Effect Transistors (FET) NTD3055L104G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

61 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.104 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

45 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD3055L104G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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