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NTD3055L104-001

Onsemi

NTD3055L104-001 by Onsemi

NTD3055L104-001 by Onsemi is a Power FET with 60V DS Breakdown Voltage, 45A IDM, and 0.104 ohm RDS(on). It is an N-CHANNEL transistor for SWITCHING applications. The package style is IN-LINE with PLASTIC/EPOXY body material.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Digiode

USA . 2,187 parts In-Stock

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Vyrian

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Nova Conductors

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Aztec Data Supply Inc.

USA . 182 parts In-Stock

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$0.370

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AZTECH Wire

Italy . 769 parts In-Stock

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Ampacity Inc.

Singapore . 1,613 parts In-Stock

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Semicontronic

India . 641 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 14,978 parts In-Stock

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SupplyDigital Components

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Problanco Electronics

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TANS Electronics

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Corphita

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Kulean Microsystems

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UHIMA Technologies

Türkiye . 969 parts In-Stock

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Continental Prestige Electronics

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Corohmni

South Africa . 404 parts In-Stock

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Bastille Electronics

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Argo Parts USA

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Overview

Unleash the power of innovation with the NTD3055L104-001 by Onsemi. Crafted with precision and expertise, this Power Field Effect Transistor is designed to revolutionize your switching applications. With a built-in diode and a maximum pulsed drain current of 45A, this enhancement mode transistor offers unparalleled performance and reliability. Trust in Onsemi's reputation for excellence and elevate your projects to new heights with the NTD3055L104-001. Experience the difference quality makes – choose Onsemi for all your power FET needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material in the package body provides durability and protection to the internal components of the FET, ensuring reliable performance over time.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance and higher current-carrying capacity, making them suitable for various switching applications where efficiency is key.

Minimum DS Breakdown Voltage: 60 V

With a minimum breakdown voltage of 60V, this FET can handle higher voltages, making it suitable for applications requiring robust performance in demanding environments.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and low on-resistance, making it ideal for power management in electronic devices.

Maximum Pulsed Drain Current (IDM): 45 A

The high maximum pulsed drain current of 45A allows this FET to handle sudden spikes in current without overheating, making it suitable for applications with varying power demands.

Avalanche Energy Rating (EAS): 61 mJ

The high avalanche energy rating of 61mJ ensures the FET can withstand voltage spikes and transient events, enhancing its reliability in challenging operating conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Using metal-oxide semiconductor technology in this FET results in improved performance, lower leakage currents, and better thermal stability, making it a reliable choice for power management applications.

Maximum Drain Current (ID): 12 A

The high maximum drain current rating of 12A allows this FET to handle significant power loads, making it suitable for applications requiring efficient power switching and control.

Maximum Drain-Source On Resistance: 0.104 ohm

The low on-resistance of 0.104 ohm results in minimal power losses and heat generation during operation, improving overall efficiency and performance of the FET in various applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD3055L104-001 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

61 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.104 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

45 A

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD3055L104-001 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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