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NDD60N550U1T4G

Onsemi

NDD60N550U1T4G by Onsemi

NDD60N550U1T4G by Onsemi is an N-CHANNEL FET with 8.5A max drain current and 96W max power dissipation. Ideal for power applications, it operates at up to 150 °C and features surface mount configuration for easy installation.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 8,647 parts In-Stock

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Flip Electronics

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Digiode

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AZTECH Wire

Italy . 360 parts In-Stock

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Metaverse IC Inc.

Canada . 50,000 parts In-Stock

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Perfect Parts

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QUARKTWIN TECHNOLOGY LTD

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TANS Electronics

Latvia . 6,877 parts In-Stock

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SupplyDigital Components

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Kulean Microsystems

USA . 3,824 parts In-Stock

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Authorized Procurement Solutions

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GreenTree Electronics

Israel . 2,390 parts In-Stock

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Problanco Electronics

Mexico . 2,061 parts In-Stock

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UHIMA Technologies

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Corphita

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Overview

Upgrade your power management system with the NDD60N550U1T4G by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are perfect for a wide range of applications. This N-CHANNEL FET offers high performance and reliability, with a maximum drain current of 8.5 A and a maximum power dissipation of 96 W. With its surface mount configuration and metal-oxide semiconductor technology, this transistor is designed to optimize efficiency and durability. Trust Onsemi to provide you with the best solution for your power needs.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs typically have lower on-state resistance and higher mobility, making them efficient for power applications.

Configuration: SINGLE

A single configuration simplifies the circuit design and reduces components, making it cost-effective and space-efficient.

Surface Mount: YES

Surface mount technology allows for easy PCB assembly, saves space, and provides better thermal performance.

Maximum Drain Current (Abs) (ID): 8.5 A

With a high maximum drain current, this FET can handle heavy loads and provide reliable performance in power applications.

Maximum Power Dissipation (Abs): 96 W

A high power dissipation rating ensures that the FET can handle high power levels without overheating, increasing the reliability of the circuit.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency, low gate drive power, and fast switching speeds, making it suitable for power management applications.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can withstand harsh environmental conditions and maintain stable performance in various applications.

Terminal Finish: TIN

Tin terminal finish provides good solderability, corrosion resistance, and reliable electrical connections, ensuring long-term performance of the FET.

Maximum Time At Peak Reflow Temperature (s): 30

The short reflow time ensures proper soldering and prevents thermal damage to the FET during assembly, guaranteeing a reliable connection.

Peak Reflow Temperature °C: 260

The high peak reflow temperature allows for proper solder melting and reflow, ensuring strong mechanical and electrical connections in the assembly process.

Technical Specifications

Power Field Effect Transistors (FET) NDD60N550U1T4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

8.5 A

Maximum Drain Current (ID):

8.5 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

NDD60N550U1T4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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