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MCH3443

Onsemi

MCH3443 by Onsemi

The Onsemi MCH3443 is a N-CHANNEL FET with 1.5A ID and 0.8W power dissipation, operating in enhancement mode. Ideal for applications requiring high drain current capability at up to 150 °C, this surface-mount transistor offers efficient power management solutions.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 1,467 parts In-Stock

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Digiode

USA . 1,277 parts In-Stock

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Problanco Electronics

Mexico . 7,169 parts In-Stock

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7,169

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Kulean Microsystems

USA . 6,504 parts In-Stock

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Kepictronics

USA . 2,800 parts In-Stock

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2,800

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SupplyDigital Components

Austria . 1,698 parts In-Stock

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TANS Electronics

Latvia . 453 parts In-Stock

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453

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Corphita

USA . 291 parts In-Stock

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UHIMA Technologies

Türkiye . 167 parts In-Stock

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Corohmni

South Africa . 65 parts In-Stock

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Overview

Upgrade your power systems with the MCH3443 by Onsemi! As a leader in semiconductor technology, Onsemi delivers high-quality Power Field Effect Transistors that are perfect for a wide range of applications. From enhancing motor control to optimizing battery management, this N-CHANNEL FET offers superior performance and reliability. With a maximum drain current of 1.5A and maximum power dissipation of 0.8W, the MCH3443 ensures efficient operation even in challenging conditions. Trust Onsemi for cutting-edge technology that delivers exceptional value and benefits to your projects.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have lower ON-resistance and higher efficiency compared to P-Channel FETs, making them a suitable choice for many power applications.

Configuration: SINGLE

Single configuration makes it easier to integrate into circuits and simplifies design, reducing overall component count and complexity.

Surface Mount: YES

Surface mount design allows for easy installation and space-saving on PCBs, making it ideal for compact electronic devices.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide better control over the switching operation and offer lower ON-state resistance, improving overall performance.

Maximum Drain Current (Abs): 1.5 A

High maximum drain current capability allows the FET to handle higher power loads, making it suitable for a wide range of applications.

Maximum Power Dissipation (Abs): 0.8 W

With a high maximum power dissipation, this FET can efficiently handle power without overheating, ensuring reliable operation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor technology provides high efficiency and performance, making this FET a reliable choice for power applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand higher temperatures, making it suitable for demanding environments.

Technical Specifications

Power Field Effect Transistors (FET) MCH3443 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

1.5 A

Maximum Drain Current (ID):

1.5 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

MCH3443 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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