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BLF6G20-75,112

NXP Semiconductors

BLF6G20-75,112 by NXP Semiconductors

BLF6G20-75,112 by NXP Semiconductors is an N-channel enhancement mode FET designed for high-performance applications. It supports a max drain current of 18 A and operates up to 225 °C, making it ideal for power amplification in RF circuits. Its surface mount configuration ensures efficient space utilization in compact designs.

Median Price

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Lifecycle Status

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4

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1k+

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RFMW

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Vyrian

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Anansix

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Digiode

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AZTECH Wire

Italy . 429 parts In-Stock

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Component Stockers USA

USA . 649 parts In-Stock

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UNI Independent Distributors

Spain . 7,671 parts In-Stock

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Corphita

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Northwest PG Solutions

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Overview

Unlock the power of innovation with the BLF6G20-75,112 from NXP Semiconductors. This cutting-edge N-channel Power FET is designed for superior performance in high-efficiency applications, ensuring reliability and durability even at elevated temperatures. With NXP's reputation for quality and excellence, harness enhanced operational capabilities and drive your projects forward confidently. Experience unmatched value and efficiency that elevate your designs to the next level!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs provide higher efficiency and faster operation, making them ideal for applications requiring high-speed switching.

Configuration: SINGLE

A single configuration simplifies circuit design and integration, making it easy to incorporate this FET into various electronic applications.

Surface Mount: YES

Surface mount technology enhances space efficiency and allows for automated assembly, leading to reduced production costs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer higher input impedance and lower power consumption, making them a good choice for power-sensitive applications.

Maximum Drain Current (Abs) (ID): 18 A

A maximum drain current of 18 A allows this FET to handle demanding loads, making it suitable for high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures low on-resistance and high speed, enhancing overall performance in various electronic circuits.

Maximum Operating Temperature: 225 °C

A high maximum operating temperature of 225 °C allows this FET to perform reliably in harsh environments without compromising functionality.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G20-75,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

18 A

Maximum Drain Current (ID):

18 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

225 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

BLF6G20-75,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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