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STD40NF02L

STMicroelectronics

STD40NF02L by STMicroelectronics

STD40NF02L by STMicroelectronics is an N-channel MOSFET ideal for switching applications, featuring a max drain current of 20 A and a breakdown voltage of 20 V. It operates in enhancement mode with a low on-resistance of 0.019 Ω. This compact FET ensures efficient performance in high-temperature environments up to 175 °C.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,346 parts In-Stock

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4,346

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Anansix

USA . 2,058 parts In-Stock

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2,058

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Vyrian

USA . 1,714 parts In-Stock

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1,714

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 832 parts In-Stock

1+ parts

$1.306

100+ parts

-

1k+ parts

$1.176

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832

$1.306

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$1.176

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MKK Technologies

India . 270 parts In-Stock

1+ parts

$2.457

100+ parts

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270

$2.457

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DigiPath Technology Company

USA . 270 parts In-Stock

1+ parts

$2.457

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270

$2.457

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Kepictronics

USA . 3,500 parts In-Stock

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3,500

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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3,000

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Corphita

USA . 1,705 parts In-Stock

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1,705

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Parana Technologies

USA . 1,560 parts In-Stock

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$1.562

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1,560

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$1.562

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Overview

Unlock exceptional performance with the STD40NF02L power FET from STMicroelectronics, a leader in cutting-edge semiconductor solutions. Designed for high-efficiency switching applications, this N-channel transistor optimizes power management while ensuring reliability and durability. Its compact footprint and advanced technology make it perfect for consumer electronics, automotive systems, and industrial controls, delivering unmatched value and efficiency to your designs. Elevate your projects with ST's trusted quality!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy makes this transistor lightweight and suitable for various electronic applications.

Polarity or Channel Type: N-CHANNEL

N-channel configuration typically provides lower on-resistance and faster switching speeds, making it efficient for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances circuit protection and simplifies the design by reducing the need for external components.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can handle rapid on/off operations, which is ideal for power management.

Surface Mount: YES

Surface mount technology allows for efficient space utilization on printed circuit boards (PCBs), leading to compact product designs.

Minimum DS Breakdown Voltage: 20 V

A minimum breakdown voltage of 20 V offers protection against voltage spikes, making it reliable in various conditions.

Package Shape: RECTANGULAR

Rectangular package shape facilitates effective PCB layout and improves thermal performance.

Terminal Form: GULL WING

Gull wing terminals are easy to solder, ensuring robust connections and better manufacturing efficiency.

Operating Mode: ENHANCEMENT MODE

Enhancement mode enhances the transistor's performance and allows for better control over the channel conductivity.

Maximum Pulsed Drain Current (IDM): 80 A

The high pulsed drain current capacity of 80 A allows for handling demanding applications without failure.

Maximum Drain Current (Abs) (ID): 20 A

With a maximum drain current rating of 20 A, this product can efficiently support high-power circuits.

No. of Terminals: 2

The simplified 2-terminal design streamlines connections, making it user-friendly for circuit designers.

Maximum Power Dissipation (Abs): 55 W

A high power dissipation of 55 W enables the transistor to manage significant power loads, enhancing its versatility.

Package Style (Meter): SMALL OUTLINE

The small outline package style is beneficial for space-constrained applications, making it ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology ensures better efficiency and switching speed, suitable for modern electronic applications.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C means this FET can operate reliably in demanding thermal environments.

Transistor Element Material: SILICON

Silicon is a standard material in FET technology, known for its reliable performance and excellent thermal stability.

Terminal Finish: TIN LEAD

Tin-lead terminal finishes enhance solderability and ensure durable connections in electronic assemblies.

Maximum Drain Current (ID): 20 A

Reiterating the maximum drain current capability of 20 A emphasizes its suitability for high-power applications.

Maximum Drain-Source On Resistance: 0.019 ohm

A low on-resistance of 0.019 ohm contributes to reduced power losses, improving overall efficiency in power applications.

Terminal Position: SINGLE

Single terminal position simplifies integration into existing designs and facilitates PCB layout.

Case Connection: DRAIN

The drain case connection configuration is straightforward for circuit designers, enabling easier implementations.

Technical Specifications

Power Field Effect Transistors (FET) STD40NF02L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

20 A

Maximum Drain Current (ID):

20 A

Maximum Drain-Source On Resistance:

.019 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

80 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD40NF02L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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