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STD40NF02LT4

STMicroelectronics

STD40NF02LT4 by STMicroelectronics

STD40NF02LT4 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 20 A, a breakdown voltage of 20 V, and operates at up to 175 °C. Ideal for power management in compact electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 3,863 parts In-Stock

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3,863

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Vyrian

USA . 2,188 parts In-Stock

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2,188

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Anansix

USA . 1,708 parts In-Stock

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1,708

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 273 parts In-Stock

1+ parts

$0.546

100+ parts

-

1k+ parts

$0.491

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273

$0.546

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$0.491

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MKK Technologies

India . 509 parts In-Stock

1+ parts

$1.026

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509

$1.026

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DigiPath Technology Company

USA . 509 parts In-Stock

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$1.026

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509

$1.026

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Authorized Procurement Solutions

USA . 3,500 parts In-Stock

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3,500

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Corphita

USA . 510 parts In-Stock

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510

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Parana Technologies

USA . 329 parts In-Stock

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$0.652

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329

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$0.652

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Overview

Elevate your designs with the STD40NF02LT4 from STMicroelectronics, a trusted leader in semiconductor innovation. This N-channel Power FET combines exceptional efficiency with robust performance, making it ideal for demanding switching applications. With its compact package and integrated diode, it simplifies PCB layouts while delivering superior power handling. Experience reliability and longevity in your projects, ensuring optimal performance every time!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This durable material offers protection against environmental factors, making the product reliable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally provide better efficiency and higher speed in switching applications, making this suitable for high-performance tasks.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances versatility by allowing for easy integration into different circuit applications, especially for protection against back EMF.

Transistor Application: SWITCHING

Designed for switching applications, this FET can effectively manage high-speed operations in electronic devices.

Surface Mount: YES

Surface mount technology allows for compact designs and helps improve assembly speed, making it suitable for modern electronic applications.

Minimum DS Breakdown Voltage: 20 V

This voltage rating ensures that the FET can operate safely in circuits with varying voltage levels, enhancing system reliability.

Package Shape: RECTANGULAR

The rectangular shape is optimized for space efficiency and adaptability in diverse electronic components layouts.

Terminal Form: GULL WING

Gull wing terminals facilitate easier soldering and provide a strong mechanical connection, improving performance and reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption and improved efficiency in power management applications.

Maximum Pulsed Drain Current (IDM): 80 A

A high pulsed current rating means this FET can handle short bursts of high current, suitable for surge conditions.

Maximum Drain Current (Abs) (ID): 20 A

The maximum rated current of 20 A enables this FET to support significant loads in various applications.

No. of Terminals: 2

A simple 2-terminal design facilitates easy integration into circuits, reducing complexity for designers.

Maximum Power Dissipation (Abs): 55 W

The high power dissipation rating keeps the FET cool under load, ensuring reliability and performance over time.

Package Style (Meter): SMALL OUTLINE

The small outline package is designed for space-saving, ideal for compact electronic devices and applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances efficiency and responsiveness in switching applications, providing a technological edge.

Maximum Operating Temperature: 175 °C

A high operating temperature allows this FET to function effectively in extreme conditions, broadening its application range.

Transistor Element Material: SILICON

Silicon is known for its excellent electronic properties, contributing to the overall performance and reliability of the FET.

Terminal Finish: TIN LEAD

The tin-lead finish ensures good solderability and helps prevent corrosion, enhancing the longevity of connections.

Maximum Drain Current (ID): 20 A

This specification reassures buyers of the FET's ability to handle consistent loads, making it ideal for demanding applications.

Maximum Drain-Source On Resistance: 0.019 ohm

Low on-resistance reduces energy losses during operation, resulting in better efficiency and lower heat generation.

Terminal Position: SINGLE

A single terminal position simplifies layout design and eases integration into compact board designs.

Case Connection: DRAIN

Direct drain connection allows for straightforward circuit configurations and enhances power delivery efficiency.

Technical Specifications

Power Field Effect Transistors (FET) STD40NF02LT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

20 A

Maximum Drain Current (ID):

20 A

Maximum Drain-Source On Resistance:

.019 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

80 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD40NF02LT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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