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STAC2942F

STMicroelectronics

STAC2942F by STMicroelectronics

STAC2942F by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 40 A, breakdown voltage of 130 V, and operates in the very high frequency band. Its robust ceramic-metal sealed package ensures reliability in demanding environments.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,627 parts In-Stock

1+ parts

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4,627

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Vyrian

USA . 4,584 parts In-Stock

1+ parts

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4,584

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Anansix

USA . 1,305 parts In-Stock

1+ parts

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1,305

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,129 parts In-Stock

1+ parts

$1.481

100+ parts

-

1k+ parts

$1.333

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1,129

$1.481

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$1.333

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MKK Technologies

India . 2,126 parts In-Stock

1+ parts

$2.785

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2,126

$2.785

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DigiPath Technology Company

USA . 2,126 parts In-Stock

1+ parts

$2.785

100+ parts

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2,126

$2.785

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Corphita

USA . 3,514 parts In-Stock

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3,514

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Parana Technologies

USA . 415 parts In-Stock

1+ parts

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100+ parts

$1.771

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415

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$1.771

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Overview

Unlock the power of innovation with the STAC2942F from STMicroelectronics—a premier choice in RF Power FETs that excels in high-frequency applications. Crafted with precision, this robust transistor offers unmatched performance and reliability, ensuring your designs achieve optimal efficiency. With a commitment to quality and cutting-edge technology, STMicroelectronics empowers you to elevate your projects, delivering unparalleled value and performance where it matters most. Transform your vision into reality!

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The durable ceramic and metal-sealed co-fired package enhances reliability and thermal performance, making this FET suitable for demanding environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them ideal for power amplification applications.

Configuration: SINGLE

A single configuration minimizes complexity and allows for better integration in designs requiring compact solutions.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET is optimized for high power output and signal fidelity.

Surface Mount: YES

Surface mount capability allows for ease of assembly and reduced PCB footprint, facilitating modern electronic designs.

Minimum DS Breakdown Voltage: 130 V

The high breakdown voltage provides robustness against voltage spikes, enhancing reliability in high-power applications.

Package Shape: RECTANGULAR

Rectangular shape facilitates efficient layout on circuit boards, optimizing space and thermal management.

Terminal Form: FLAT

Flat terminals ensure good contact with PCB, reducing inductance, and improving overall performance.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control of the FET during low signal conditions, improving efficiency in amplification.

Highest Frequency Band: VERY HIGH FREQUENCY BAND

Suitable for very high frequency applications, making it ideal for RF power amplification and communication systems.

Maximum Drain Current (Abs) (ID): 40 A

A maximum drain current rating of 40 A allows for high power handling, making it suitable for demanding applications.

No. of Terminals: 4

The four-terminal design provides flexibility in circuit design and allows for improved performance in power configurations.

Maximum Power Dissipation (Abs): 625 W

With a high power dissipation rating, it can handle substantial power without overheating, ensuring longevity and reliability.

Package Style (Meter): FLATPACK

Flatpack style allows for better thermal performance and compact design, essential in RF applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides beneficial characteristics such as high input impedance and low gate drive power, making it perfect for RF applications.

Maximum Operating Temperature: 200 °C

The ability to operate at high temperatures without degradation ensures reliability in harsh environments.

Transistor Element Material: SILICON

Silicon offers excellent electrical performance and is suitable for a wide range of RF applications.

Maximum Drain Current (ID): 40 A

The capability to handle 40 A of drain current makes this FET suitable for high-power amplifier designs.

Terminal Position: DUAL

Dual terminal positions allow for more flexible design and integration into various circuit configurations.

Case Connection: SOURCE

Direct source connection ensures minimal parasitic capacitance, enhancing the overall performance of the FET in high-frequency applications.

Technical Specifications

RF Power Field Effect Transistors (FET) STAC2942F attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

130 V

Maximum Drain Current (Abs) (ID):

40 A

Maximum Drain Current (ID):

40 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

VERY HIGH FREQUENCY BAND

JESD-30 Code:

R-CDFP-F4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLATPACK

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

STAC2942F Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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