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NVD6414ANT4G

Onsemi

NVD6414ANT4G by Onsemi

NVD6414ANT4G by Onsemi is a Power FET with 100V DS Breakdown Voltage, 117A IDM, and 0.037 ohm RDS. Ideal for automotive applications due to AEC-Q101 standard compliance and 175 °C operating temperature. Single-channel design with built-in diode in a small outline package for efficient power management.

Median Price

$0.500

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

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Rochester

USA . 500 parts In-Stock

1+ parts

$0.500

100+ parts

$0.490

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$0.480

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500

$0.500

$0.490

$0.480

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Digiode

USA . 165 parts In-Stock

1+ parts

$0.475

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165

$0.475

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Chip Stock

USA . 75,000 parts In-Stock

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Vyrian

USA . 5,454 parts In-Stock

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Corphita

USA . 707 parts In-Stock

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$0.450

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707

$0.450

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Corohmni

South Africa . 445 parts In-Stock

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$0.500

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445

$0.500

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AZTECH Wire

Italy . 483 parts In-Stock

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$15.300

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483

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Perfect Parts

USA . 23,707 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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Kulean Microsystems

USA . 7,035 parts In-Stock

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Problanco Electronics

Mexico . 6,366 parts In-Stock

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TANS Electronics

Latvia . 3,733 parts In-Stock

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SupplyDigital Components

Austria . 2,129 parts In-Stock

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UHIMA Technologies

Türkiye . 538 parts In-Stock

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Overview

Discover the power of the NVD6414ANT4G by Onsemi, a top-tier manufacturer known for delivering high-quality Power Field Effect Transistors. Ideal for a range of applications, this N-channel transistor boasts a single configuration with a built-in diode, offering enhanced performance and reliability. With a minimum DS breakdown voltage of 100V and maximum drain current of 32A, this transistor provides exceptional value and benefits to customers seeking efficiency and durability in their electronic systems. Experience the advantages of Onsemi's cutting-edge technology with the NVD6414ANT4G.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and protection, making the product suitable for various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher mobility and lower resistance, making them more efficient for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for simplified circuit design and protection against reverse current flow.

Surface Mount: YES

Surface mount capability makes installation easier and saves space on the circuit board.

Minimum DS Breakdown Voltage: 100 V

With a high breakdown voltage, this FET can handle high voltage applications without the risk of breakdown.

Maximum Power Dissipation (Abs): 100 W

The high power dissipation rating allows the FET to handle significant power levels without overheating.

Maximum Drain-Source On Resistance: 0.037 ohm

The low on-resistance results in reduced power loss and improved efficiency in the FET.

Maximum Operating Temperature: 175 °C

The high operating temperature range makes this FET suitable for use in harsh environments without performance degradation.

Technical Specifications

Power Field Effect Transistors (FET) NVD6414ANT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

154 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

32 A

Maximum Drain Current (ID):

32 A

Maximum Drain-Source On Resistance:

.037 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

117 A

Reference Standard:

AEC-Q101

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

NVD6414ANT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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