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NTP12N50

Onsemi

NTP12N50 by Onsemi

NTP12N50 by Onsemi is a Power FET with 500V DS Breakdown Voltage, 42A IDM, and 0.5 ohm RDS(on). It's an N-CHANNEL transistor for SWITCHING applications. The device operates in ENHANCEMENT MODE and has a max power dissipation of 202W.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Vyrian

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Digiode

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Kulean Microsystems

USA . 6,786 parts In-Stock

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TANS Electronics

Latvia . 5,985 parts In-Stock

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SupplyDigital Components

Austria . 2,139 parts In-Stock

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Problanco Electronics

Mexico . 1,751 parts In-Stock

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Corphita

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Corohmni

South Africa . 358 parts In-Stock

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UHIMA Technologies

Türkiye . 216 parts In-Stock

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Overview

Unleash the power of innovation with the NTP12N50 by Onsemi. As a leader in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are ideal for a wide range of switching applications. With a maximum operating temperature of 150 °C and a minimum DS Breakdown Voltage of 500V, this N-CHANNEL transistor offers unrivaled performance and reliability. Say goodbye to inefficiency and hello to optimized power management with the NTP12N50 - your go-to solution for all your power needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection to the internal components, making the transistor suitable for various harsh environments.

Minimum DS Breakdown Voltage: 500 V

Allows for the handling of high voltage applications with a robust breakdown voltage rating.

Maximum Pulsed Drain Current (IDM): 42 A

Capable of handling high currents during pulsed operation, making it suitable for applications requiring high power transient capabilities.

Maximum Power Dissipation (Abs): 202 W

High power dissipation rating allows for effective heat dissipation, ensuring the transistor can handle high power loads without overheating.

Maximum Operating Temperature: 150 °C

Can operate efficiently at high temperatures, making it suitable for applications where temperature control is critical.

Maximum Drain-Source On Resistance: 0.5 ohm

Low on-resistance results in minimal power loss and efficient switching performance, making it ideal for applications requiring high power efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NTP12N50 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

720 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

42 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTP12N50 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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