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NTMS5835NLR2G

Onsemi

NTMS5835NLR2G by Onsemi

NTMS5835NLR2G by Onsemi is a N-CHANNEL FET with 40V DS Breakdown Voltage and 12A Drain Current. Ideal for applications requiring high power dissipation up to 2.6W, such as in small outline packages where space is limited. Operating in enhancement mode, it offers low on-resistance of 0.014 ohm for efficient performance at temperatures up to 150 °C.

Median Price

$0.370

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 300 parts In-Stock

1+ parts

-

100+ parts

$0.370

1k+ parts

$0.307

10k+ parts

$0.274

300

-

$0.370

$0.307

$0.274

Distributors (In-Stock)

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Digiode

USA . 2,100 parts In-Stock

1+ parts

$0.288

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-

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2,100

$0.288

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Chip Stock

USA . 15,000 parts In-Stock

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15,000

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Vyrian

USA . 10,455 parts In-Stock

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10,455

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LIBRA Elektronik GmbH

Germany . 814 parts In-Stock

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814

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Distributors (Availability)

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Corphita

USA . 851 parts In-Stock

1+ parts

$0.273

100+ parts

-

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851

$0.273

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Corohmni

South Africa . 295 parts In-Stock

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$0.303

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295

$0.303

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Component Stockers USA

USA . 275 parts In-Stock

1+ parts

$0.310

100+ parts

$0.290

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275

$0.310

$0.290

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AZTECH Wire

Italy . 687 parts In-Stock

1+ parts

$14.070

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687

$14.070

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RC Electronics

USA . 79,356 parts In-Stock

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Metaverse IC Inc.

Canada . 40,659 parts In-Stock

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Perfect Parts

USA . 18,836 parts In-Stock

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Kepictronics

USA . 8,065 parts In-Stock

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Problanco Electronics

Mexico . 6,637 parts In-Stock

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6,637

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TANS Electronics

Latvia . 5,575 parts In-Stock

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5,575

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Kulean Microsystems

USA . 4,168 parts In-Stock

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Authorized Procurement Solutions

USA . 4,000 parts In-Stock

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4,000

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SupplyDigital Components

Austria . 3,494 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 2,121 parts In-Stock

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A-Z Elektronik GmbH

Germany . 1,530 parts In-Stock

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1,530

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Futuretech Components

Singapore . 850 parts In-Stock

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850

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UHIMA Technologies

Türkiye . 206 parts In-Stock

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206

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Overview

Experience unmatched performance and reliability with the NTMS5835NLR2G from Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-notch Small Signal Field Effect Transistors that are perfect for a wide range of applications. From power management to signal amplification, this N-CHANNEL transistor offers superior quality and efficiency. With a built-in diode and high operating temperature, the NTMS5835NLR2G ensures optimal performance in any environment. Trust Onsemi for all your transistor needs and elevate your projects to new heights of success.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good protection for the transistor while keeping it lightweight and cost-effective.

Polarity or Channel Type: N-CHANNEL

Allows for efficient electron flow, making it suitable for various electronic applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and can save space, as the diode is already integrated.

Surface Mount: YES

Facilitates easy and efficient assembly onto circuit boards, saving time and effort.

Minimum DS Breakdown Voltage: 40 V

Provides a good margin of safety for the transistor when subjected to high voltages.

Maximum Drain Current (Abs) (ID): 12 A

Allows for high power applications and ensures the transistor can handle heavy loads.

Maximum Power Dissipation (Abs): 2.6 W

Can dissipate heat effectively, preventing overheating and ensuring longevity.

Operating Mode: ENHANCEMENT MODE

Offers flexibility in controlling the flow of current, making it suitable for a wide range of applications.

Maximum Operating Temperature: 150 °C

Can withstand high temperatures, making it reliable in various operating environments.

Maximum Drain-Source On Resistance: 0.014 ohm

Provides low resistance for efficient current flow and minimal power loss.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTMS5835NLR2G attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

9.2 A

Maximum Drain-Source On Resistance:

.014 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Element Material:

SILICON

Trade Compliance

NTMS5835NLR2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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