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NTMS3P03R2G

Onsemi

NTMS3P03R2G by Onsemi

NTMS3P03R2G by Onsemi is a P-CHANNEL FET with 30V DS Breakdown Voltage, ideal for SWITCHING applications. It features a max ID of 3.86A, 0.085 ohm Drain-Source Resistance, and operates in ENHANCEMENT MODE. With a peak reflow temp of 260 °C and small outline package style, it offers high performance in various electronic devices.

Median Price

$0.390

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 67,544 parts In-Stock

1+ parts

-

100+ parts

$0.383

1k+ parts

$0.318

10k+ parts

$0.283

67,544

-

$0.383

$0.318

$0.283

Verical

USA . 47,314 parts In-Stock

1+ parts

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$0.398

10k+ parts

$0.354

47,314

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-

$0.398

$0.354

Distributors (In-Stock)

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Digiode

USA . 2,252 parts In-Stock

1+ parts

$0.298

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2,252

$0.298

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Chip Stock

USA . 77,000 parts In-Stock

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77,000

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Vyrian

USA . 10,100 parts In-Stock

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Bristol Electronics

USA . 2,500 parts In-Stock

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2,500

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Distributors (Availability)

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Corphita

USA . 1,040 parts In-Stock

1+ parts

$0.283

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$0.283

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Corohmni

South Africa . 282 parts In-Stock

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$0.314

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282

$0.314

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AZTECH Wire

Italy . 294 parts In-Stock

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$14.520

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294

$14.520

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Continental Prestige Electronics

USA . 67,544 parts In-Stock

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$0.288

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67,544

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$0.288

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Problanco Electronics

Mexico . 4,934 parts In-Stock

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Kepictronics

USA . 4,913 parts In-Stock

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A-Z Elektronik GmbH

Germany . 4,854 parts In-Stock

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Assy Fe

Spain . 4,413 parts In-Stock

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Kulean Microsystems

USA . 3,724 parts In-Stock

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SupplyDigital Components

Austria . 2,708 parts In-Stock

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Authorized Procurement Solutions

USA . 2,500 parts In-Stock

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TANS Electronics

Latvia . 1,185 parts In-Stock

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Perfect Parts

USA . 1,081 parts In-Stock

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UHIMA Technologies

Türkiye . 448 parts In-Stock

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448

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Overview

Upgrade your electronic devices with the NTMS3P03R2G by Onsemi - a high-quality P-Channel Small Signal FET designed for switching applications. Manufactured with precision and expertise, this transistor offers reliable performance and efficiency. With a built-in diode and enhanced mode operation, it provides seamless functionality. Perfect for a wide range of applications, this surface-mount transistor is a valuable addition to any project, offering increased power dissipation and low drain-source resistance. Trust Onsemi's reputation for excellence and choose the NTMS3P03R2G for optimal performance and quality.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable and lightweight material, making the transistor suitable for a variety of applications.

Polarity or Channel Type: P-CHANNEL

P-channel transistors are known for their low on-state resistance and high current carrying capability, making them efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode allows for easy and efficient circuit designs, saving space and components.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring reliable performance in such scenarios.

Surface Mount: YES

Suitable for automated assembly processes and compact designs, making it ideal for modern electronic devices.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this transistor can handle higher voltages without failing.

Maximum Drain Current (ID): 3.86 A

Capable of handling high current loads, making it suitable for power applications.

Maximum Power Dissipation: 0.73 W

Efficient power handling capability, reducing the risk of overheating during operation.

Maximum Operating Temperature: 150 °C

Can operate at high temperatures without performance degradation, ensuring reliability in demanding environments.

Maximum Drain-Source On Resistance: 0.085 ohm

Low on-resistance results in minimal power loss and high efficiency in switching applications.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTMS3P03R2G attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

3.86 A

Maximum Drain Current (ID):

2.34 A

Maximum Drain-Source On Resistance:

.085 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

135 pF

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMS3P03R2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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