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NTMS4107NR2

Onsemi

NTMS4107NR2 by Onsemi

NTMS4107NR2 by Onsemi is a N-CHANNEL FET with 30V DS Breakdown Voltage and 15A Drain Current. Ideal for SWITCHING applications, it features a SINGLE configuration with BUILT-IN DIODE in a PLASTIC/EPOXY package. Operating in ENHANCEMENT MODE, it has a max power dissipation of 2.5W at 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 1,853 parts In-Stock

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Digiode

USA . 1,764 parts In-Stock

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1,764

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A-Z Elektronik GmbH

Germany . 7,239 parts In-Stock

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Kulean Microsystems

USA . 6,386 parts In-Stock

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Problanco Electronics

Mexico . 6,210 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Corphita

USA . 2,114 parts In-Stock

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Assy Fe

Spain . 1,820 parts In-Stock

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UHIMA Technologies

Türkiye . 827 parts In-Stock

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SupplyDigital Components

Austria . 817 parts In-Stock

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TANS Electronics

Latvia . 473 parts In-Stock

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Corohmni

South Africa . 259 parts In-Stock

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Overview

Experience the superior quality and reliability of the NTMS4107NR2 by Onsemi, a leading manufacturer in the field of Small Signal Field Effect Transistors. This N-CHANNEL transistor with a built-in diode is perfect for switching applications, offering customers unparalleled performance and efficiency. With a maximum drain current of 15A and a minimum DS breakdown voltage of 30V, this transistor provides exceptional value and benefits. Trust Onsemi to deliver cutting-edge technology and top-notch products that will take your projects to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material is commonly used for packaging small signal FETs as it provides good insulation and protection for the internal components.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs are commonly used in switching applications due to their lower ON resistance and higher current handling capabilities.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for simplified circuit designs and can protect the FET from reverse voltage spikes.

Transistor Application: SWITCHING

This FET is specifically designed for switching applications, making it a reliable choice for such functions.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltage requirements in various applications.

Surface Mount: YES

Being surface mountable makes this FET easier to integrate onto circuit boards, saving space and simplifying the assembly process.

Maximum Drain Current (Abs) (ID): 15 A

With a maximum drain current of 15A, this FET can handle high current loads effectively.

Maximum Power Dissipation (Abs): 2.5 W

The maximum power dissipation of 2.5W ensures that the FET can operate reliably without overheating under load.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor FETs are known for their high input impedance and good switching characteristics, making them suitable for various applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand higher temperature environments without compromising performance.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTMS4107NR2 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

15 A

Maximum Drain Current (ID):

11 A

Maximum Drain-Source On Resistance:

.0045 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMS4107NR2 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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