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NTF3055L108T3LFG

Onsemi

NTF3055L108T3LFG by Onsemi

NTF3055L108T3LFG by Onsemi is a Power FET with 60V DS Breakdown Voltage, 9A IDM, and 0.12 ohm RDS(on). Ideal for switching applications in enhancement mode operation. Features include built-in diode, small outline package style, and dual terminal position.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 2,434 parts In-Stock

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Digiode

USA . 152 parts In-Stock

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Nova Conductors

Japan . 88 parts In-Stock

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Aztec Data Supply Inc.

USA . 1,098 parts In-Stock

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$0.310

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AZTECH Wire

Italy . 676 parts In-Stock

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$5.055

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676

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Ampacity Inc.

Singapore . 542 parts In-Stock

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$7.050

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Problanco Electronics

Mexico . 5,885 parts In-Stock

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Continental Prestige Electronics

USA . 5,256 parts In-Stock

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Kulean Microsystems

USA . 3,075 parts In-Stock

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SupplyDigital Components

Austria . 1,843 parts In-Stock

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Argo Parts USA

USA . 1,669 parts In-Stock

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Corphita

USA . 1,468 parts In-Stock

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TANS Electronics

Latvia . 1,265 parts In-Stock

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UHIMA Technologies

Türkiye . 840 parts In-Stock

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Corohmni

South Africa . 478 parts In-Stock

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Bastille Electronics

Australia . 450 parts In-Stock

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Overview

Unlock the power of efficient switching with the NTF3055L108T3LFG by Onsemi. Crafted by a trusted manufacturer, this N-CHANNEL Power FET offers reliability and performance for a variety of applications. With a built-in diode and an enhanced mode operation, this transistor provides seamless functionality. Experience the benefits of a high breakdown voltage, low on-resistance, and fast switching speeds. Elevate your projects with the exceptional value and quality that Onsemi brings to the table. Step into the future of power management with the NTF3055L108T3LFG.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material used in the package body provides durability and protection for the internal components of the Power FET, making it suitable for various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their high efficiency and low on-resistance, making them ideal for switching applications where a low power loss is desired.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for convenient reverse bias protection, ensuring the safety and reliability of the device in various circuit configurations.

Transistor Application: SWITCHING

Designed specifically for switching applications, this Power FET offers fast switching speed and low power dissipation, making it suitable for efficient power management.

Surface Mount: YES

The surface mount capability of this Power FET simplifies the assembly process and allows for compact designs, making it ideal for space-constrained applications.

Minimum DS Breakdown Voltage: 60 V

The high breakdown voltage of 60V ensures that the Power FET can handle high voltage applications with ease, providing a reliable and safe operation.

Maximum Drain Current (ID): 3A

With a maximum drain current of 3A, this Power FET can handle high current loads effectively, making it suitable for a wide range of applications.

Maximum Power Dissipation (Abs): 2.1 W

The maximum power dissipation of 2.1W allows the Power FET to operate efficiently without overheating, ensuring a reliable performance under various operating conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The Metal-Oxide Semiconductor technology used in this Power FET provides high switching speeds and low on-resistance, making it an excellent choice for efficient power management.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175°C, this Power FET can withstand high temperature environments, ensuring a stable performance in challenging conditions.

Technical Specifications

Power Field Effect Transistors (FET) NTF3055L108T3LFG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

74 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

3 A

Maximum Drain Current (ID):

3 A

Maximum Drain-Source On Resistance:

.12 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-261AA

JESD-30 Code:

R-PDSO-G4

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

9 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTF3055L108T3LFG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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