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NTF3N08L

Onsemi

NTF3N08L by Onsemi

NTF3N08L by Onsemi is a single N-channel power FET with 80V DS breakdown voltage and 0.155 ohm max RDS. It is used for switching applications in enhancement mode, featuring a small outline package with gull wing terminals. Ideal for drain connections in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 2,165 parts In-Stock

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Vyrian

USA . 1,670 parts In-Stock

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1,670

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SupplyDigital Components

Austria . 6,554 parts In-Stock

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Kulean Microsystems

USA . 3,772 parts In-Stock

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Corphita

USA . 931 parts In-Stock

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TANS Electronics

Latvia . 418 parts In-Stock

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UHIMA Technologies

Türkiye . 280 parts In-Stock

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Corohmni

South Africa . 150 parts In-Stock

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Problanco Electronics

Mexico . 7 parts In-Stock

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Overview

Enhance the performance of your electronic devices with the NTF3N08L Power Field Effect Transistor by Onsemi. Known for their high-quality components, Onsemi delivers reliable solutions for a wide range of applications in the electronics industry. This N-CHANNEL transistor offers efficient switching capabilities, making it ideal for enhancing the functionality of your devices. With a minimum DS Breakdown Voltage of 80V and a maximum Drain-Source On Resistance of 0.155 ohms, this transistor provides exceptional value and benefits to customers looking to optimize their electronic designs. Experience the advantages of Onsemi's NTF3N08L for your next project.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good insulation and protection for the internal components, ensuring durability and reliability.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher mobility and conductivity, making them ideal for high-performance applications.

Configuration: SINGLE

Simplifies circuit design and reduces complexity, making it easier to integrate the FET into a system.

Transistor Application: SWITCHING

Designed specifically for switching applications, providing efficient and fast operation.

Surface Mount: YES

Enables easy and reliable mounting on circuit boards, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 80 V

Can handle higher voltage levels, ensuring safe and stable operation in various applications.

Package Shape: RECTANGULAR

Facilitates easy handling and placement on the circuit board, enhancing overall design flexibility.

Terminal Form: GULL WING

Provides secure and reliable connections, minimizing the risk of accidental disconnection or short circuits.

Operating Mode: ENHANCEMENT MODE

Allows for precise control and modulation of the FET's conductivity, enhancing performance and efficiency.

No. of Terminals: 4

Provides multiple connection points for flexibility in circuit design and application.

Package Style (Meter): SMALL OUTLINE

Compact size saves space on the board, enabling more efficient use of available real estate.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Offers high performance and reliability, with low power consumption and excellent switching characteristics.

Transistor Element Material: SILICON

Silicon is a common and reliable semiconductor material, ensuring consistent performance and durability.

Terminal Finish: TIN LEAD

Provides good conductivity and corrosion resistance, ensuring reliable connections over time.

Maximum Drain-Source On Resistance: 0.155 ohm

Low on-resistance reduces power loss and heat generation, enhancing efficiency and overall performance.

Terminal Position: DUAL

Allows for versatile and flexible circuit connections, enabling various circuit configurations and applications.

Case Connection: DRAIN

Designed for easy connection to the drain terminal, simplifying circuit layout and connections.

Technical Specifications

Power Field Effect Transistors (FET) NTF3N08L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Configuration:

Minimum DS Breakdown Voltage:

80 V

Maximum Drain-Source On Resistance:

.155 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-261

JESD-30 Code:

R-PDSO-G4

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTF3N08L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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