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NTD5805NG

Onsemi

NTD5805NG by Onsemi

NTD5805NG by Onsemi is a Power FET with 40V DS Breakdown Voltage, 85A IDM, and 0.0095 ohm RDS(ON). It is an N-CHANNEL transistor for SWITCHING applications. Operating in ENHANCEMENT MODE, it has a max temp of 175 °C and EAS of 80 mJ.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 2,399 parts In-Stock

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Vyrian

USA . 1,280 parts In-Stock

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Metaverse IC Inc.

Canada . 10,100 parts In-Stock

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SupplyDigital Components

Austria . 7,151 parts In-Stock

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Kulean Microsystems

USA . 6,526 parts In-Stock

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Problanco Electronics

Mexico . 2,850 parts In-Stock

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TANS Electronics

Latvia . 1,934 parts In-Stock

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Corphita

USA . 1,742 parts In-Stock

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UHIMA Technologies

Türkiye . 629 parts In-Stock

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Corohmni

South Africa . 162 parts In-Stock

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Overview

Unleash the power of innovation with the NTD5805NG by Onsemi, a top-tier manufacturer known for quality and reliability. This N-channel Power Field Effect Transistor (FET) offers exceptional performance in switching applications, with a built-in diode for added convenience. With a high pulsing drain current of 85A and low drain-source resistance, this transistor is designed to meet your needs for efficiency and durability. Trust Onsemi to deliver cutting-edge technology that exceeds expectations and elevates your projects to new heights. Experience the difference with the NTD5805NG.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protects the internal components of the transistor from external elements, ensuring long-lasting performance.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower resistance and higher speed compared to P-channel FETs, making them suitable for high performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode allows for simplified circuit design and protection against reverse polarity, making installation easier and increasing reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient and reliable performance in controlling the flow of current.

Minimum DS Breakdown Voltage: 40 V

With a high breakdown voltage, this transistor can handle higher voltages without breakdown, ensuring stable operation in various circuit conditions.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide secure connections and ease of soldering onto a circuit board, ensuring reliable electrical contact.

Maximum Pulsed Drain Current (IDM): 85 A

A high maximum pulsed drain current allows this transistor to handle sudden surges in current without damage, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 80 mJ

The high avalanche energy rating indicates the ability of this transistor to withstand high energy pulses, ensuring robust performance in harsh operating conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency and reliability in switching applications, making this transistor a cost-effective and dependable choice.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175 °C, this transistor can operate efficiently in high-temperature environments, expanding its range of applications.

Maximum Drain Current (ID): 51 A

The high maximum drain current rating allows this transistor to handle large currents without overheating, ensuring stable performance in demanding conditions.

Maximum Drain-Source On Resistance: 0.0095 ohm

The low drain-source on resistance minimizes power loss and heat generation, improving efficiency and performance of the transistor in high-current applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD5805NG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

80 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (ID):

51 A

Maximum Drain-Source On Resistance:

.0095 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

85 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD5805NG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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