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NTD50N03R-35G

Onsemi

NTD50N03R-35G by Onsemi

NTD50N03R-35G by Onsemi is a Power FET with 25V DS Breakdown Voltage, 180A IDM, and 0.014 ohm RDS(on). Ideal for SWITCHING applications, it features an N-CHANNEL configuration with a built-in diode. The transistor operates in ENHANCEMENT MODE and has a SILICON element material.

Median Price

$0.114

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 35,200 parts In-Stock

1+ parts

-

100+ parts

$0.119

1k+ parts

$0.099

10k+ parts

$0.088

35,200

-

$0.119

$0.099

$0.088

Verical

USA . 18,400 parts In-Stock

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$0.110

18,400

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$0.110

Distributors (In-Stock)

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Digiode

USA . 1,925 parts In-Stock

1+ parts

$0.093

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1,925

$0.093

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Vyrian

USA . 5,494 parts In-Stock

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5,494

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Distributors (Availability)

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Corphita

USA . 1,141 parts In-Stock

1+ parts

$0.088

100+ parts

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1,141

$0.088

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Corohmni

South Africa . 362 parts In-Stock

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$0.098

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362

$0.098

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AZTECH Wire

Italy . 1,027 parts In-Stock

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$11.550

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1,027

$11.550

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Continental Prestige Electronics

USA . 35,200 parts In-Stock

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$0.089

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35,200

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$0.089

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TANS Electronics

Latvia . 7,996 parts In-Stock

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7,996

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Authorized Procurement Solutions

USA . 6,000 parts In-Stock

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6,000

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SupplyDigital Components

Austria . 5,716 parts In-Stock

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5,716

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Problanco Electronics

Mexico . 4,663 parts In-Stock

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4,663

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Kulean Microsystems

USA . 3,802 parts In-Stock

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3,802

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UHIMA Technologies

Türkiye . 739 parts In-Stock

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739

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Perfect Parts

USA . 728 parts In-Stock

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728

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Overview

Unleash the power of innovation with the NTD50N03R-35G by Onsemi! Crafted with precision and expertise, this Power Field Effect Transistor offers unmatched reliability and performance. Whether you're in need of robust switching capabilities or efficient power management, this N-channel transistor has got you covered. Its single configuration with a built-in diode ensures seamless operation, while its low on-resistance maximizes efficiency. Trust Onsemi's commitment to quality and excellence, and elevate your applications to new heights with the NTD50N03R-35G. Experience the value and benefits it brings firsthand!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides good insulation and protection for the transistor, ensuring reliability and durability.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have lower ON-state resistance which leads to better efficiency and performance.

Minimum DS Breakdown Voltage: 25 V

With a minimum breakdown voltage of 25V, this FET can handle higher voltages without breakdown, making it suitable for a variety of applications.

Maximum Pulsed Drain Current (IDM): 180 A

The high pulsed drain current rating of 180A allows this FET to handle large current spikes effectively, making it suitable for high-power applications.

Avalanche Energy Rating (EAS): 20 mJ

The high avalanche energy rating of 20mJ indicates the FET's ability to withstand short duration high energy transients, increasing its robustness and reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers good performance and reliability characteristics, making this FET a dependable choice for switching applications.

Maximum Drain Current (ID): 7.8 A

The maximum drain current rating of 7.8A indicates the current carrying capacity of the FET, making it suitable for medium power applications.

Maximum Drain-Source On Resistance: 0.014 ohm

The low on-resistance of 0.014 ohm results in minimal power loss and high efficiency in operation, making this FET a good choice for power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD50N03R-35G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

20 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

25 V

Maximum Drain Current (ID):

7.8 A

Maximum Drain-Source On Resistance:

.014 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

180 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD50N03R-35G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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