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NTD4806N-1G

Onsemi

NTD4806N-1G by Onsemi

NTD4806N-1G by Onsemi is a N-channel FET with 30V DS breakdown voltage, 150A IDM, and 0.0094 ohm max RDS(on). Ideal for switching applications due to its single configuration with built-in diode. Package style: in-line, terminal finish: tin, and operating mode: enhancement mode.

Median Price

$0.132

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

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Rochester

USA . 2,850 parts In-Stock

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-

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$0.132

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$0.110

10k+ parts

$0.098

2,850

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$0.132

$0.110

$0.098

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Digiode

USA . 582 parts In-Stock

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$0.103

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$0.103

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Vyrian

USA . 4,712 parts In-Stock

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PC Components Company LLC

USA . 57 parts In-Stock

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Bristol Electronics

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Corphita

USA . 1,152 parts In-Stock

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$0.097

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Corohmni

South Africa . 380 parts In-Stock

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$0.108

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AZTECH Wire

Italy . 393 parts In-Stock

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$13.290

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 24,902 parts In-Stock

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SupplyDigital Components

Austria . 7,551 parts In-Stock

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Kulean Microsystems

USA . 5,361 parts In-Stock

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TANS Electronics

Latvia . 3,771 parts In-Stock

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Kepictronics

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GreenTree Electronics

Israel . 2,808 parts In-Stock

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A-Z Elektronik GmbH

Germany . 2,463 parts In-Stock

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Problanco Electronics

Mexico . 2,281 parts In-Stock

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Perfect Parts

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UHIMA Technologies

Türkiye . 197 parts In-Stock

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Overview

Upgrade your power system with the NTD4806N-1G by Onsemi, a high-quality Power Field Effect Transistor that delivers unmatched performance and reliability. With a single configuration and built-in diode, this N-CHANNEL FET is perfect for switching applications. Its enhanced mode operation ensures efficient power management while providing a maximum pulsed drain current of 150A. Trust Onsemi's expertise in semiconductor technology to provide you with a top-of-the-line product that offers value, benefits, and advantages to meet all your power needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good insulation and protection for the internal components, ensuring durability and reliability.

Polarity or Channel Type: N-CHANNEL

Offers efficient switching capabilities and low ON resistance.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and allows for easy integration into various applications.

Transistor Application: SWITCHING

Designed specifically for high-speed switching applications, ensuring efficient performance.

Minimum DS Breakdown Voltage: 30 V

Provides a high breakdown voltage limit, enhancing the product's reliability and safety.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Offers low leakage current and high input impedance, making it suitable for low-power applications.

Maximum Drain Current (ID): 11 A

Capable of handling high current loads, making it suitable for power applications.

Maximum Drain-Source On Resistance: 0.0094 ohm

Low ON resistance reduces power loss and improves efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NTD4806N-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

220 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

11 A

Maximum Drain-Source On Resistance:

.0094 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

150 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4806N-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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