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NTB30N20G

Onsemi

NTB30N20G by Onsemi

The Onsemi NTB30N20G is a N-CHANNEL FET with 200V DS Breakdown Voltage, 90A IDM, and 0.081 ohm RDS(on). Ideal for SWITCHING applications, it features a built-in diode, operates in ENHANCEMENT MODE, and has a max power dissipation of 214W.

Median Price

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Lifecycle Status

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1k+

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Vyrian

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Digiode

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LWI Electronics Inc

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AZTECH Wire

Italy . 1,197 parts In-Stock

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Kulean Microsystems

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Problanco Electronics

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QUARKTWIN TECHNOLOGY LTD

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TANS Electronics

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SupplyDigital Components

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UHIMA Technologies

Türkiye . 603 parts In-Stock

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Overview

Enhance your power switching applications with the NTB30N20G by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality power field effect transistors that offer reliability and performance. Whether you're looking to improve efficiency or enhance control, this N-channel transistor with a built-in diode is the perfect solution. With a maximum drain current of 30A and a low on-resistance of 0.081 ohm, this transistor can handle high-power tasks with ease. Trust Onsemi for all your power transistor needs and experience the difference in quality and performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good protection for the internal components, ensuring durability and reliability.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs generally have better performance and lower conduction losses compared to P-Channel FETs.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplified design with built-in diode for reverse current flow protection.

Transistor Application: SWITCHING

Ideal for switching applications due to fast switching speeds and low ON resistance.

Surface Mount: YES

Allows for easy and secure mounting on PCBs, saving space and enabling automated assembly.

Minimum DS Breakdown Voltage: 200 V

Provides a high breakdown voltage for reliable operation in high voltage applications.

Package Shape: RECTANGULAR

Sleek and space-saving design for efficient PCB layout and heat dissipation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs have better control over the flow of current, making them suitable for various applications.

Maximum Power Dissipation (Abs): 214 W

High power dissipation capability ensures stable performance even under high load conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Offers high performance with low power consumption and fast switching speeds.

Maximum Operating Temperature: 175 °C

Can operate in high temperature environments, making it suitable for a wide range of applications.

Maximum Drain-Source On Resistance: 0.081 ohm

Low ON resistance results in minimal power loss and efficient switching operation.

Technical Specifications

Power Field Effect Transistors (FET) NTB30N20G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

450 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

30 A

Maximum Drain Current (ID):

30 A

Maximum Drain-Source On Resistance:

.081 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

90 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB30N20G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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