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NTB30N20

Onsemi

NTB30N20 by Onsemi

The Onsemi NTB30N20 is a N-CHANNEL FET with 200V DS Breakdown Voltage, ideal for SWITCHING applications. It features a max IDM of 90A and EAS of 450mJ, making it suitable for high-power operations. With a low 0.081 ohm RDS(on), this MOSFET operates in ENHANCEMENT MODE at up to 175 °C, offering reliable performance in various power electronics designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 9,983 parts In-Stock

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Digiode

USA . 2,008 parts In-Stock

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AZTECH Wire

Italy . 854 parts In-Stock

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$11.110

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854

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Component Stockers USA

USA . 776 parts In-Stock

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$99.990

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Kepictronics

USA . 15,000 parts In-Stock

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Problanco Electronics

Mexico . 5,455 parts In-Stock

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SupplyDigital Components

Austria . 3,877 parts In-Stock

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Kulean Microsystems

USA . 2,097 parts In-Stock

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TANS Electronics

Latvia . 955 parts In-Stock

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UHIMA Technologies

Türkiye . 455 parts In-Stock

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Corphita

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Corohmni

South Africa . 162 parts In-Stock

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Overview

Unlock the power of efficient switching with the NTB30N20 by Onsemi. Crafted with precision and reliability in mind, this N-CHANNEL Power FET offers seamless operation for a variety of applications. With a built-in diode and an impressive maximum drain current of 30 A, this transistor ensures optimal performance in every use case. Whether you're looking to enhance your electronics or streamline your power management systems, the NTB30N20 delivers unparalleled value and efficiency that will elevate your projects to new heights. Trust in Onsemi's expertise and experience to bring you top-tier quality that meets your needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components, ensuring a longer product lifespan.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance and are more efficient compared to P-channel FETs, making this product a good choice for various applications.

Minimum DS Breakdown Voltage: 200 V

Can handle high voltages without breakdown, making it suitable for high-power applications.

Maximum Pulsed Drain Current (IDM): 90 A

Capable of handling high currents, making it suitable for applications where large current spikes occur.

Maximum Power Dissipation (Abs): 214 W

Can dissipate heat effectively, allowing for continuous operation under high power conditions.

Maximum Operating Temperature: 175 °C

Can operate in high-temperature environments without sacrificing performance, making it suitable for industrial applications.

Technical Specifications

Power Field Effect Transistors (FET) NTB30N20 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

450 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

30 A

Maximum Drain Current (ID):

30 A

Maximum Drain-Source On Resistance:

.081 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

90 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB30N20 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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