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NTB30N06LG

Onsemi

NTB30N06LG by Onsemi

NTB30N06LG by Onsemi is a N-CHANNEL FET with 60V DS Breakdown Voltage, ideal for SWITCHING applications. It features 30A Drain Current, 0.046 ohm On Resistance, and 88.2W Power Dissipation in a SMALL OUTLINE package. Operating at up to 175 °C, it offers high performance in various electronic devices.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Vyrian

USA . 9,027 parts In-Stock

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Digiode

USA . 2,355 parts In-Stock

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AZTECH Wire

Italy . 988 parts In-Stock

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Kepictronics

USA . 15,000 parts In-Stock

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SupplyDigital Components

Austria . 8,036 parts In-Stock

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Authorized Procurement Solutions

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Problanco Electronics

Mexico . 3,530 parts In-Stock

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Corphita

USA . 1,906 parts In-Stock

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TANS Electronics

Latvia . 981 parts In-Stock

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Kulean Microsystems

USA . 978 parts In-Stock

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Corohmni

South Africa . 461 parts In-Stock

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UHIMA Technologies

Türkiye . 371 parts In-Stock

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Overview

Unlock the power of cutting-edge technology with the NTB30N06LG Power Field Effect Transistor by Onsemi. Manufactured by a trusted name in the industry, this N-CHANNEL transistor offers unrivaled quality and performance for all your switching needs. With a maximum drain current of 30 A and an impressive maximum power dissipation of 88.2 W, this transistor ensures reliable operation even in the most demanding applications. Say goodbye to limitations and embrace efficiency with the NTB30N06LG - the ultimate choice for your power management requirements.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material used for the package body provides durability and protection for the internal components, ensuring a longer lifespan for the FET.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have lower on-resistance and higher current capability compared to P-Channel FETs, making them suitable for various switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps to protect the FET from reverse current flow, improving the overall reliability of the device.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control the flow of current in electronic circuits.

Surface Mount: YES

Being surface mountable makes installation easier and more convenient, especially in compact electronic designs.

Minimum DS Breakdown Voltage: 60 V

With a minimum breakdown voltage of 60V, this FET can handle higher voltages without experiencing failure, providing protection for the circuit.

Maximum Pulsed Drain Current (IDM): 90 A

The high pulsed drain current capability of 90A allows the FET to handle short bursts of high current, making it suitable for demanding applications.

Maximum Power Dissipation (Abs): 88.2 W

The high power dissipation rating of 88.2W indicates that this FET can handle higher power levels without overheating, ensuring reliable performance.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175 °C, this FET can operate reliably in high-temperature environments without degradation in performance.

Technical Specifications

Power Field Effect Transistors (FET) NTB30N06LG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

101 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

30 A

Maximum Drain Current (ID):

30 A

Maximum Drain-Source On Resistance:

.046 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

90 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB30N06LG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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