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MTP12P10

Onsemi

MTP12P10 by Onsemi

MTP12P10 by Onsemi is a P-CHANNEL FET with 100V DS Breakdown Voltage, ideal for SWITCHING applications. It features 12A Drain Current, 0.3 ohm On Resistance, and 28A Pulsed Drain Current. With a max power dissipation of 75W and operating temperature range from -65 to 150 °C, it offers reliable performance in various environments.

Median Price

$4.510

Lifecycle Status

Suppliers In-Stock

22

In-Stock Inventory

1k+

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Component Electronics Inc.

Canada . 6 parts In-Stock

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$3.850

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$2.880

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American Microsemiconductor Inc.

USA . 10 parts In-Stock

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ComSIT Distribution GmbH

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Vyrian

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Freddi Giovanni

Italy . 720 parts In-Stock

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Atlantic Semiconductor

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Bristol Electronics

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ACDS - Activité Composants Distribution Service

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ECAB

Sweden . 160 parts In-Stock

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Digiode

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MRC Electronics

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Ack Elektronik San.Tic.Ltd.Sti

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Speed Components Ltd

Israel . 48 parts In-Stock

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PUI

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North Shore Components

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Resion

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Beckwith Electronics

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Semtec, LLC

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Sunrise Surplus Inc.

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Eagle Technology Solutions

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LittleDiode

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Corohmni

South Africa . 394 parts In-Stock

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Component Stockers USA

USA . 448 parts In-Stock

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Kepictronics

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Corphita

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A-Z Elektronik GmbH

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Problanco Electronics

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SupplyDigital Components

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UHIMA Technologies

Türkiye . 783 parts In-Stock

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TANS Electronics

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Kulean Microsystems

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Perfect Parts

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A-Plus Industry Inc.

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Overview

Unlock the power of efficiency with the MTP12P10 by Onsemi. Crafted with precision and reliability, this P-Channel Power Field Effect Transistor is a game-changer for switching applications. Its single configuration with built-in diode ensures seamless operation while the metal-oxide semiconductor technology guarantees top-notch performance. From its high breakdown voltage to its maximum power dissipation, this transistor delivers unparalleled value and benefits to customers seeking optimal results. Trust in Onsemi's expertise and elevate your project with the MTP12P10.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the FET, making it reliable for various applications.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their lower on-state resistance and higher current capabilities compared to N-channel FETs, making them suitable for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for efficient energy transfer and helps protect the circuit from reverse current flow.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control the flow of current, making it ideal for power management tasks.

Minimum DS Breakdown Voltage: 100 V

With a high breakdown voltage, this FET can handle higher voltages without breakdown, ensuring reliability in high-power circuits.

Maximum Pulsed Drain Current (IDM): 28 A

The high pulsed drain current rating allows for brief spikes in current without damaging the FET, making it suitable for applications with varying loads.

Maximum Power Dissipation (Abs): 75 W

The high power dissipation capability of this FET ensures that it can handle high power levels without overheating, making it reliable for demanding tasks.

Maximum Operating Temperature: 150 °C

With a high operating temperature range, this FET can operate in harsh environments without performance degradation, making it versatile for various applications.

Maximum Drain-Source On Resistance: 0.3 ohm

The low on-resistance of this FET results in minimal power loss and efficient current flow, making it suitable for high-performance applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFETs are known for their high switching speeds and low input capacitance, making this FET ideal for high-frequency switching applications.

Technical Specifications

Power Field Effect Transistors (FET) MTP12P10 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LEADFORM OPTIONS ARE AVAILABLE

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.3 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-65 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

28 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

NO

Terminal Finish:

Tin/Lead (Sn/Pb)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTP12P10 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

NSN

5961-01-532-3573, 5961015323573

NIIN

015323573

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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