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MTP12P10G

Onsemi

MTP12P10G by Onsemi

MTP12P10G by Onsemi is a P-CHANNEL FET with 100V DS Breakdown Voltage, 12A Max ID, and 0.3 ohm RDS. Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with 28A IDM. Package: PLASTIC/EPOXY, RECTANGULAR shape, THROUGH-HOLE terminals.

Median Price

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Lifecycle Status

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5

In-Stock Inventory

1k+

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Vyrian

USA . 6,535 parts In-Stock

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Digiode

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Prism Electronics

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First Choice Components Inc.

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AZTECH Wire

Italy . 713 parts In-Stock

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$21.640

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 27,970 parts In-Stock

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Problanco Electronics

Mexico . 6,586 parts In-Stock

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SupplyDigital Components

Austria . 5,780 parts In-Stock

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Authorized Procurement Solutions

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A-Z Elektronik GmbH

Germany . 4,734 parts In-Stock

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TANS Electronics

Latvia . 4,471 parts In-Stock

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Perfect Parts

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Corphita

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Kulean Microsystems

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UHIMA Technologies

Türkiye . 311 parts In-Stock

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Corohmni

South Africa . 144 parts In-Stock

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Assy Fe

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Overview

Discover the power of the MTP12P10G by Onsemi, a top-of-the-line Power Field Effect Transistor designed for high-performance switching applications. With its robust construction and cutting-edge technology, this P-CHANNEL FET offers unmatched reliability and efficiency. Whether you're working on industrial machinery, automotive systems, or consumer electronics, this transistor is sure to deliver exceptional results. Trust Onsemi's reputation for quality and innovation, and experience the value and benefits of the MTP12P10G today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material makes the product lightweight and durable, ideal for applications where weight and physical stress are a concern.

Polarity or Channel Type: P-CHANNEL

The P-channel type offers lower ON resistance and higher electron mobility, making it efficient and suitable for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps with reverse current protection and simplifies the circuit design by eliminating the need for an external diode.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast operation and efficient power management.

Minimum DS Breakdown Voltage: 100 V

The high breakdown voltage enables the transistor to handle large voltage swings and protects the circuit from voltage spikes.

Maximum Power Dissipation (Abs): 75 W

With a high power dissipation capability, the transistor can handle large power loads without overheating or failing.

Maximum Operating Temperature: 150 °C

The high operating temperature range allows the transistor to function reliably in harsh environments or high-temperature conditions.

Technical Specifications

Power Field Effect Transistors (FET) MTP12P10G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LEADFORM OPTIONS ARE AVAILABLE

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.3 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

28 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

NO

Terminal Finish:

Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTP12P10G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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