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MTP15N05EL

Onsemi

MTP15N05EL by Onsemi

MTP15N05EL by Onsemi is a N-CHANNEL FET with 50V DS Breakdown Voltage, 15A Drain Current, and 0.1 ohm On Resistance. It is used in power applications requiring high efficiency and performance due to its 75W Power Dissipation capability. The transistor's METAL-OXIDE SEMICONDUCTOR technology makes it suitable for various industrial and consumer electronics.

Median Price

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Lifecycle Status

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6

In-Stock Inventory

1k+

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Vyrian

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Digiode

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LIBRA Elektronik GmbH

Germany . 250 parts In-Stock

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Elcom Components

USA . 6 parts In-Stock

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First Choice Components Inc.

USA . 5 parts In-Stock

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Semtec, LLC

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TANS Electronics

Latvia . 8,254 parts In-Stock

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Problanco Electronics

Mexico . 8,106 parts In-Stock

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UHIMA Technologies

Türkiye . 834 parts In-Stock

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SupplyDigital Components

Austria . 812 parts In-Stock

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Kulean Microsystems

USA . 491 parts In-Stock

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Corohmni

South Africa . 408 parts In-Stock

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Corphita

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Perfect Parts

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Overview

Unleash the power of innovation with the MTP15N05EL by Onsemi. As a leader in Power Field Effect Transistors (FET), Onsemi delivers unmatched quality and reliability in every product. The MTP15N05EL offers a range of applications, from industrial to automotive, providing customers with versatile solutions for their needs. With a high maximum drain current of 15A and a low on-resistance of 0.1 ohm, this N-CHANNEL transistor ensures optimal performance and efficiency. Trust Onsemi to deliver cutting-edge technology that exceeds expectations.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components of the FET, ensuring long-lasting performance.

Minimum DS Breakdown Voltage: 50 V

Allows for safe operation in applications where higher voltage levels are required.

Maximum Drain Current (Abs): 15 A

Capable of handling high current levels, making it suitable for power applications.

Maximum Power Dissipation (Abs): 75 W

Can dissipate a high amount of power without overheating, ensuring reliable operation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Provides efficient switching characteristics and low leakage current, improving overall performance.

Transistor Element Material: SILICON

Silicon is a reliable and widely-used material for transistors, offering good thermal conductivity and electrical properties.

Technical Specifications

Power Field Effect Transistors (FET) MTP15N05EL attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Configuration:

Minimum DS Breakdown Voltage:

50 V

Maximum Drain Current (Abs) (ID):

15 A

Maximum Drain Current (ID):

15 A

Maximum Drain-Source On Resistance:

.1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Element Material:

SILICON

Trade Compliance

MTP15N05EL Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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