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MMSF4P01HDR2

Onsemi

MMSF4P01HDR2 by Onsemi

MMSF4P01HDR2 by Onsemi is a P-CHANNEL FET with 12V DS Breakdown Voltage, 26A IDM, and 0.08 ohm RDS. Ideal for SWITCHING applications in small outline packages with 8 terminals. Operating at up to 150 °C, it features a built-in diode and tin lead finish for enhanced performance.

Median Price

$1.500

Lifecycle Status

Suppliers In-Stock

10

In-Stock Inventory

1k+

Distributors (In-Stock)

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Mentor Electronics Marketing, LLC

USA . 12,500 parts In-Stock

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Cyclops Electronics Ltd

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R&J Components

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Prism Electronics

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ACDS - Activité Composants Distribution Service

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Bristol Electronics

USA . 1,865 parts In-Stock

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$0.792

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Digiode

USA . 1,806 parts In-Stock

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Atlantic Semiconductor

USA . 551 parts In-Stock

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PC Components Company LLC

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Vyrian

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Authorized Procurement Solutions

USA . 15,000 parts In-Stock

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Assy Fe

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Kulean Microsystems

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Perfect Parts

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SupplyDigital Components

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Problanco Electronics

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TANS Electronics

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Kepictronics

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Cyclops Electronics Ltd (Excess)

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Glotronic Ltd.

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Corphita

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Futuretech Components

Singapore . 956 parts In-Stock

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UHIMA Technologies

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Corohmni

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Overview

Enhance your power control applications with the MMSF4P01HDR2 by Onsemi. Designed with quality and precision, this P-Channel Power FET offers reliable performance for switching applications. With a maximum pulsing drain current of 26A and a low on-resistance of 0.08 ohm, this transistor delivers exceptional power dissipation. Whether you're designing for automotive, industrial, or consumer electronics, trust Onsemi to provide cutting-edge solutions that bring value and efficiency to your projects. Experience the advantages of enhanced mode operation and built-in diode configuration with the MMSF4P01HDR2.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the transistor, ensuring reliable performance in various environments.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low on-resistance and high current-carrying capability, making them suitable for power switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for improved efficiency in switching applications and protects the transistor from voltage spikes.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring optimal performance and efficiency in power control circuits.

Surface Mount: YES

Surface mount capability simplifies the assembly process and saves space on the PCB, making it ideal for compact designs.

Minimum DS Breakdown Voltage: 12 V

With a high breakdown voltage, this FET can handle higher voltages without breakdown, ensuring reliability in demanding operating conditions.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer easier control and higher efficiency in power switching applications compared to depletion mode devices.

Maximum Pulsed Drain Current (IDM): 26 A

High pulsed drain current rating enables this FET to handle short-term overloads without compromising performance or reliability.

Maximum Drain Current (Abs) (ID): 5.1 A

With a high drain current rating, this FET can handle moderate power loads with ease, making it suitable for a variety of applications.

Maximum Power Dissipation (Abs): 2.5 W

The low power dissipation of this FET helps in minimizing heat generation and improving overall efficiency in power control circuits.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can withstand elevated temperatures without performance degradation, ensuring reliability in harsh environments.

Maximum Drain-Source On Resistance: 0.08 ohm

Low on-resistance reduces power losses and improves efficiency in power switching applications, making this FET an excellent choice for high-performance circuits.

Technical Specifications

Power Field Effect Transistors (FET) MMSF4P01HDR2 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Minimum DS Breakdown Voltage:

12 V

Maximum Drain Current (Abs) (ID):

5.1 A

Maximum Drain Current (ID):

5.1 A

Maximum Drain-Source On Resistance:

.08 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

26 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MMSF4P01HDR2 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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