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MMSF3P03HDR2

Onsemi

MMSF3P03HDR2 by Onsemi

MMSF3P03HDR2 by Onsemi is a P-CHANNEL FET with 30V DS Breakdown Voltage, 50A IDM, and 0.1 ohm RDS. Ideal for SWITCHING applications, it features SINGLE configuration with BUILT-IN DIODE in a PLASTIC/EPOXY package. Operating in ENHANCEMENT MODE at up to 150 °C, this transistor has GULL WING terminals and offers 567mJ EAS rating.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Cyclops Electronics Ltd

UK . 1,960 parts In-Stock

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Vyrian

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Digiode

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TANS Electronics

Latvia . 4,250 parts In-Stock

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Problanco Electronics

Mexico . 2,813 parts In-Stock

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Assy Fe

Spain . 2,500 parts In-Stock

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SupplyDigital Components

Austria . 1,569 parts In-Stock

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Futuretech Components

Singapore . 956 parts In-Stock

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Corphita

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Corohmni

South Africa . 322 parts In-Stock

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UHIMA Technologies

Türkiye . 267 parts In-Stock

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Kulean Microsystems

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Overview

Unleash the power of innovation with the MMSF3P03HDR2 by Onsemi. This P-Channel Power Field Effect Transistor is a game-changer in the world of switching applications. With a high-quality build and single configuration with built-in diode, this transistor offers unparalleled value. Whether you're looking to enhance your system's performance or improve efficiency, this transistor delivers with a maximum pulsing drain current of 50 A and minimum DS breakdown voltage of 30 V. Trust Onsemi for top-notch technology and reliability in every application.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material is lightweight and durable, making the product suitable for a variety of applications.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their lower conduction losses and higher efficiency, making them a good choice for power management applications.

Transistor Application: SWITCHING

This FET is specifically designed for switching applications, ensuring reliable and efficient operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer better control and performance compared to depletion mode FETs, making this product a reliable choice for various applications.

Maximum Pulsed Drain Current (IDM): 50 A

With a high maximum pulsed drain current, this FET can handle surges and spikes in current without issue.

Maximum Power Dissipation (Abs): 2.5 W

The low power dissipation of this FET helps prevent overheating and ensures long-term reliability.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can operate in a wide range of environments without overheating.

Technical Specifications

Power Field Effect Transistors (FET) MMSF3P03HDR2 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

567 mJ

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

4.6 A

Maximum Drain Current (ID):

4.6 A

Maximum Drain-Source On Resistance:

.1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

50 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MMSF3P03HDR2 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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