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MMSF3P02HDR2G

Onsemi

MMSF3P02HDR2G by Onsemi

The Onsemi MMSF3P02HDR2G is a P-CHANNEL FET with 20V DS Breakdown Voltage, 30A IDM, and 0.075 ohm RDS(ON). Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with a max power dissipation of 2.5W. Suitable for surface mount designs, it has a temperature range of -55 to 150 °C.

Median Price

$0.830

Lifecycle Status

Suppliers In-Stock

16

In-Stock Inventory

1k+

Distributors (Authorized)

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Rochester

USA . 16,235 parts In-Stock

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$0.830

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$0.810

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$0.800

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$0.830

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Digiode

USA . 1,330 parts In-Stock

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Flip Electronics

USA . 12,500 parts In-Stock

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Vyrian

USA . 8,161 parts In-Stock

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Chip Stock

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Microfarads

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ACDS - Activité Composants Distribution Service

France . 996 parts In-Stock

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J2 Sourcing AB

Sweden . 752 parts In-Stock

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LWI Electronics Inc

India . 680 parts In-Stock

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North Shore Components

USA . 407 parts In-Stock

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A&K Electronics

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Bristol Electronics

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Contempo Components LLC

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Semi Source

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NexGen Digital

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Prism Electronics

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Corphita

USA . 821 parts In-Stock

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$0.747

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Corohmni

South Africa . 212 parts In-Stock

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$0.830

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AZTECH Wire

Italy . 1,071 parts In-Stock

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Perfect Parts

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Kulean Microsystems

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Problanco Electronics

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Kepictronics

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SupplyDigital Components

Austria . 3,669 parts In-Stock

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TANS Electronics

Latvia . 1,253 parts In-Stock

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UHIMA Technologies

Türkiye . 381 parts In-Stock

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Overview

Discover the power of the MMSF3P02HDR2G by Onsemi, a top-quality P-CHANNEL Power Field Effect Transistor with a single configuration and built-in diode. Perfect for switching applications, this transistor offers reliable performance and efficiency. With a maximum pulsing drain current of 30A and an avalanche energy rating of 567 mJ, this component ensures optimal power management. Trust in Onsemi's expertise in semiconductor technology and elevate your projects with the value and benefits of the MMSF3P02HDR2G.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material provides durability and heat resistance to the product, making it suitable for various applications.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low ON-resistance and high efficiency, making them ideal for applications where power conservation is important.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and protects against reverse current flow, enhancing the overall reliability of the device.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast and efficient operation when turning circuits on or off.

Surface Mount: YES

Surface mount technology allows for easy and efficient PCB assembly, saving space and reducing overall product size.

Minimum DS Breakdown Voltage: 20 V

A breakdown voltage of 20V ensures reliable operation and protection against voltage spikes or overloads.

Maximum Pulsed Drain Current (IDM): 30 A

High maximum pulsed drain current allows for handling spikes in current without causing damage to the device.

Maximum Drain Current (ID): 5.6 A

A maximum drain current of 5.6A enables the FET to handle high current loads, making it suitable for various power applications.

Maximum Power Dissipation (Abs): 2.5 W

With a high power dissipation rating, the FET can handle significant power levels without overheating or failing.

Maximum Operating Temperature: 150 °C

The FET can operate at high temperatures up to 150 °C, making it suitable for applications where heat dissipation is a concern.

Technical Specifications

Power Field Effect Transistors (FET) MMSF3P02HDR2G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED, LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

567 mJ

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

5.6 A

Maximum Drain Current (ID):

5.6 A

Maximum Drain-Source On Resistance:

.075 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

30 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MMSF3P02HDR2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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