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BS107ARL1

Onsemi

BS107ARL1 by Onsemi

BS107ARL1 by Onsemi is a N-CHANNEL FET with 200V DS breakdown voltage. It has 0.25A max drain current, 6.4 ohm RDS(on), and operates in enhancement mode for switching applications. The transistor comes in a cylindrical package with through-hole terminals, suitable for use at up to 150°C.

Median Price

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Lifecycle Status

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4

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1k+

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VNN

France . 1,457 parts In-Stock

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Digiode

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Nova Conductors

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Vyrian

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Ampacity Inc.

Singapore . 891 parts In-Stock

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$6.050

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AZTECH Wire

Italy . 472 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 19,232 parts In-Stock

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Problanco Electronics

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Kulean Microsystems

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SupplyDigital Components

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Continental Prestige Electronics

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TANS Electronics

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Glotronic Ltd.

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Corphita

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Argo Parts USA

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Corohmni

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UHIMA Technologies

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Bastille Electronics

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Assy Fe

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Overview

Discover the power of the BS107ARL1 by Onsemi, a top-quality small signal Field Effect Transistor. With Onsemi's reputation for excellence in semiconductor manufacturing, this N-CHANNEL transistor offers reliable performance and efficiency in switching applications. Its single configuration with a built-in diode ensures seamless operation, while its high DS breakdown voltage of 200V guarantees durability. Experience the value of this product with its maximum drain current of 0.25A and minimal power dissipation of 0.35W. Unleash the potential of your electronics with the BS107ARL1 by Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy makes this transistor lightweight and durable.

Polarity or Channel Type: N-CHANNEL

The N-channel design allows for efficient switching in various applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and improves efficiency.

Transistor Application: SWITCHING

Ideal for applications requiring fast switching speeds and high efficiency.

Minimum DS Breakdown Voltage: 200 V

With a high breakdown voltage, this transistor can handle high voltages safely.

Package Shape: ROUND

The round shape allows for easy installation and space-saving in tight layouts.

Terminal Form: THROUGH-HOLE

The through-hole terminals provide a secure connection to circuit boards.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for precise control of the transistor's behavior.

Maximum Drain Current (Abs): 0.25 A

Capable of handling currents up to 0.25 A for reliable performance in various applications.

No. of Terminals: 3

The 3-terminal design simplifies circuit connections and allows for versatile use.

Maximum Power Dissipation (Abs): 0.35 W

With a maximum power dissipation of 0.35 W, this transistor can handle moderate power levels.

Package Style (Meter): CYLINDRICAL

The cylindrical package style offers a compact and efficient design.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology ensures high performance and reliability.

Maximum Operating Temperature: 150 °C

Operates efficiently at temperatures up to 150°C.

Transistor Element Material: SILICON

Silicon material provides excellent electrical properties and reliability.

Terminal Finish: Tin/Lead (Sn/Pb)

Tin/lead terminal finish ensures a reliable connection for long-term use.

Maximum Drain-Source On Resistance: 6.4 ohm

Low on-resistance ensures minimal power loss and efficient operation.

Terminal Position: BOTTOM

Bottom terminal position facilitates easy mounting and installation in circuits.

Maximum Time At Peak Reflow Temperature (s): 30

Can withstand peak reflow temperatures for up to 30 seconds during assembly.

Peak Reflow Temperature °C: 235

With a peak reflow temperature of 235°C, this transistor can endure soldering processes with ease.

Technical Specifications

Small Signal Field Effect Transistors (FET) BS107ARL1 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

EUROPEAN PART NUMBER

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

.25 A

Maximum Drain Current (ID):

.25 A

Maximum Drain-Source On Resistance:

6.4 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-226AA

JESD-30 Code:

O-PBCY-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

ROUND

Package Style (Meter):

CYLINDRICAL

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Tin/Lead (Sn/Pb)

Terminal Form:

THROUGH-HOLE

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

BS107ARL1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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