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3LN01S

Onsemi

3LN01S by Onsemi

3LN01S by Onsemi is a N-CHANNEL FET with 0.15A drain current and 0.15W power dissipation. Ideal for applications requiring single configuration, such as in surface mount circuits operating at up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 2,422 parts In-Stock

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Digiode

USA . 736 parts In-Stock

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Native Components

USA . 145 parts In-Stock

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$0.585

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145

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Northwest PG Solutions

USA . 1,973 parts In-Stock

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Kulean Microsystems

USA . 6,966 parts In-Stock

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Problanco Electronics

Mexico . 4,121 parts In-Stock

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Corphita

USA . 1,820 parts In-Stock

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SupplyDigital Components

Austria . 1,569 parts In-Stock

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TANS Electronics

Latvia . 1,164 parts In-Stock

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Assy Fe

Spain . 1,000 parts In-Stock

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Corohmni

South Africa . 376 parts In-Stock

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UHIMA Technologies

Türkiye . 52 parts In-Stock

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Overview

Unleash the power of innovation with the 3LN01S Power Field Effect Transistor by Onsemi. Known for their superior quality and reliability, Onsemi delivers cutting-edge solutions for a wide range of applications. Ideal for enhancing performance in electronic devices, this N-CHANNEL FET offers maximum efficiency and power dissipation, making it a must-have component for your next project. Experience the difference with Onsemi's advanced technology and elevate your designs to new heights.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance and higher mobility compared to P-channel FETs, making them more efficient for many applications.

Configuration: SINGLE

Single configuration FETs are easier to mount and control, making them suitable for simpler circuit designs and applications.

Surface Mount: YES

Surface mount FETs save space and allow for automated assembly, making them ideal for compact electronic devices and mass production.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are normally off and require a positive voltage to turn on, providing better control and preventing current flow when not needed.

Maximum Drain Current (Abs) (ID): 0.15 A

With a maximum drain current of 0.15A, this FET can handle moderate power applications efficiently without overheating.

Maximum Power Dissipation (Abs): 0.15 W

The FET's maximum power dissipation of 0.15W indicates that it can operate reliably within its specified power limits, ensuring longevity and stability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high performance and reliability, making this FET suitable for demanding applications where precision and durability are essential.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high temperatures without performance degradation, making it suitable for industrial applications and harsh environments.

Technical Specifications

Power Field Effect Transistors (FET) 3LN01S attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.15 A

Maximum Drain Current (ID):

.15 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

3LN01S Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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