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3LN01M

Onsemi

3LN01M by Onsemi

3LN01M by Onsemi is a N-CHANNEL FET with 0.15A max drain current and 0.15W power dissipation in SINGLE configuration. Ideal for applications requiring low power consumption at up to 150 °C, such as portable electronics and battery-operated devices due to its surface mount capability.

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Lifecycle Status

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2

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1k+

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Digiode

USA . 1,294 parts In-Stock

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Native Components

USA . 112 parts In-Stock

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Northwest PG Solutions

USA . 655 parts In-Stock

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$26.892

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Authorized Procurement Solutions

USA . 25,000 parts In-Stock

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Kepictronics

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Problanco Electronics

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SupplyDigital Components

Austria . 7,753 parts In-Stock

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Assy Fe

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Kulean Microsystems

USA . 1,840 parts In-Stock

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Corphita

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Corohmni

South Africa . 435 parts In-Stock

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TANS Electronics

Latvia . 288 parts In-Stock

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UHIMA Technologies

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Overview

Transform your power management systems with the 3LN01M by Onsemi. Crafted with precision and quality, this N-CHANNEL Power FET is designed to enhance efficiency and performance in a variety of applications. From consumer electronics to industrial machinery, this surface-mounted transistor offers reliable operation and maximum power dissipation. Upgrade your designs with the latest in Metal-Oxide Semiconductor technology and experience the benefits of enhanced power management firsthand.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs offer lower ON resistance and higher current-carrying capability compared to P-CHANNEL FETs, making them suitable for high power applications.

Configuration: SINGLE

Single configuration simplifies circuit design and reduces component count, making the product cost-effective and easier to implement.

Surface Mount: YES

Surface mount capability allows for easy integration onto PCBs, saving space and simplifying assembly in electronic devices.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are normally off, providing better control and efficiency in switching applications.

Maximum Drain Current (Abs) (ID): 0.15 A

With a high maximum drain current, this FET can handle moderate power levels, making it suitable for various applications.

Maximum Power Dissipation (Abs): 0.15 W

The low power dissipation ensures minimal heat generation, enhancing the reliability and efficiency of the product.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high input impedance, low input capacitance, and faster switching speeds, making the FET ideal for high-frequency applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high-temperature environments, ensuring reliable performance in various conditions.

Maximum Drain Current (ID): 0.15 A

The high maximum drain current rating allows the FET to handle current fluctuations without being damaged, increasing its reliability in demanding applications.

Technical Specifications

Power Field Effect Transistors (FET) 3LN01M attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.15 A

Maximum Drain Current (ID):

.15 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

3LN01M Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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