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3LN04CH-TL-E

Onsemi

3LN04CH-TL-E by Onsemi

3LN04CH-TL-E by Onsemi is a N-CHANNEL FET with 0.35A max drain current and 0.6W power dissipation. Ideal for applications requiring high efficiency in a compact design, such as portable electronics or power management systems. Operating at up to 150 °C, it offers enhanced performance in various temperature conditions.

Median Price

-

Lifecycle Status

EOL

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Chip Stock

USA . 38,000 parts In-Stock

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Digiode

USA . 1,050 parts In-Stock

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Vyrian

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Native Components

USA . 385 parts In-Stock

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$63.870

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$61.315

385

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Northwest PG Solutions

USA . 367 parts In-Stock

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$70.257

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SupplyDigital Components

Austria . 6,634 parts In-Stock

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TANS Electronics

Latvia . 6,196 parts In-Stock

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Problanco Electronics

Mexico . 1,730 parts In-Stock

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Corphita

USA . 1,260 parts In-Stock

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Kulean Microsystems

USA . 886 parts In-Stock

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UHIMA Technologies

Türkiye . 673 parts In-Stock

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Corohmni

South Africa . 198 parts In-Stock

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Overview

Enhance your electronic devices with the 3LN04CH-TL-E by Onsemi, a top-of-the-line N-CHANNEL Power Field Effect Transistor. Onsemi is renowned for their superior quality and reliability in the semiconductor industry, and this product is no exception. Ideal for applications requiring high efficiency and performance, this FET offers unmatched value with its enhanced mode operation and maximum power dissipation of 0.6W. Trust Onsemi to deliver cutting-edge technology that meets your needs and exceeds your expectations.

Feature Benefit Bullets

Polarity or Channel Type N-CHANNEL

N-CHANNEL FETs generally have lower ON resistance and higher current handling capability compared to P-CHANNEL FETs, making them suitable for many power applications.

Configuration SINGLE

Single configuration FETs are simpler to use and require fewer external components, leading to a more straightforward design and potentially lower cost.

Surface Mount YES

Surface mount FETs are easier to mount on printed circuit boards, saving space and allowing for automated assembly processes.

Operating Mode ENHANCEMENT MODE

Enhancement mode FETs are normally off and require a positive voltage at the gate to turn on, providing better control over the switching behavior.

Maximum Drain Current (Abs) (ID) 0.35 A

With a maximum drain current of 0.35 A, this FET can handle moderate power loads, suitable for many low to medium power applications.

Maximum Power Dissipation (Abs) 0.6 W

The maximum power dissipation of 0.6 W indicates that this FET can handle heat dissipation efficiently, contributing to its reliability and longevity.

Field Effect Transistor Technology METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor FETs offer good overall performance characteristics, including high input impedance, fast switching speeds, and low input capacitance.

Maximum Operating Temperature 150 °C

With a maximum operating temperature of 150 °C, this FET can operate in harsh environmental conditions without risk of overheating or performance degradation.

Terminal Finish Tin/Bismuth (Sn/Bi)

The tin/bismuth terminal finish provides good solderability and reliability, ensuring a secure electrical connection in the assembly process.

Technical Specifications

Power Field Effect Transistors (FET) 3LN04CH-TL-E attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.35 A

Maximum Drain Current (ID):

.35 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e6

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin/Bismuth (Sn/Bi)

Trade Compliance

3LN04CH-TL-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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