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3LN01N

Onsemi

3LN01N by Onsemi

3LN01N by Onsemi is a N-CHANNEL FET with 0.15A max drain current and 0.4W power dissipation. Ideal for applications requiring enhancement mode operation, such as power management systems. Operating up to 150 °C, it utilizes metal-oxide semiconductor technology for efficient performance.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 871 parts In-Stock

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Digiode

USA . 632 parts In-Stock

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SupplyDigital Components

Austria . 7,809 parts In-Stock

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TANS Electronics

Latvia . 7,223 parts In-Stock

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Problanco Electronics

Mexico . 5,008 parts In-Stock

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Corphita

USA . 1,542 parts In-Stock

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Kulean Microsystems

USA . 1,276 parts In-Stock

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Native Components

USA . 776 parts In-Stock

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Corohmni

South Africa . 478 parts In-Stock

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UHIMA Technologies

Türkiye . 280 parts In-Stock

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Northwest PG Solutions

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Overview

Unleash the power of innovation with the 3LN01N by Onsemi! Manufactured by a trusted industry leader, this N-CHANNEL Power Field Effect Transistor offers unparalleled performance and reliability. Ideal for a wide range of applications, this Enhancement Mode FET provides customers with superior value and efficiency. Say goodbye to compromise and hello to cutting-edge technology with the 3LN01N from Onsemi.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are commonly used in low-side switch applications, making this product suitable for various switching circuits.

Configuration: SINGLE

The single configuration simplifies circuit design and makes it easier to integrate into systems, reducing complexity and potential points of failure.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer faster switching speeds and higher efficiency compared to depletion mode FETs, making this product ideal for applications where rapid response is required.

Maximum Drain Current (Abs) (ID): 0.15 A

With a maximum drain current of 0.15 A, this FET can handle moderate current loads, making it suitable for low-power applications.

Maximum Power Dissipation (Abs): 0.4 W

The low power dissipation of 0.4 W helps in minimizing heat generation and improving overall efficiency of the circuit.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor FETs offer high input impedance and low output capacitance, making this product efficient and ideal for high-frequency applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand higher temperatures, enhancing its reliability in harsh environmental conditions.

Maximum Drain Current (ID): 0.15 A

The maximum drain current rating of 0.15 A ensures that the FET can handle current spikes or surges without exceeding its specified limits, improving overall system reliability.

Technical Specifications

Power Field Effect Transistors (FET) 3LN01N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.15 A

Maximum Drain Current (ID):

.15 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Trade Compliance

3LN01N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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