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BLF6G22L-40P,112

NXP Semiconductors

BLF6G22L-40P,112 by NXP Semiconductors

BLF6G22L-40P,112 by NXP Semiconductors is an N-channel enhancement mode FET ideal for high-power applications. It supports a max drain current of 16 A and operates at temperatures up to 200 °C. This MOSFET is perfect for efficient power management in RF amplifiers.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 8,659 parts In-Stock

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Anansix

USA . 939 parts In-Stock

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Digiode

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459

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Advanced Electronics

New Zealand . 150 parts In-Stock

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$1.104

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$1.005

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$0.905

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Northwest PG Solutions

USA . 1,467 parts In-Stock

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$2.427

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AZTECH Wire

Italy . 693 parts In-Stock

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$17.470

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One Stop Electronics

USA . 1,557 parts In-Stock

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UNI Independent Distributors

Spain . 5,453 parts In-Stock

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Corphita

USA . 2,104 parts In-Stock

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Native Components

USA . 12 parts In-Stock

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Overview

Elevate your designs with the BLF6G22L-40P,112 from NXP Semiconductors. Renowned for their commitment to quality, NXP delivers this reliable N-channel Power FET, ensuring optimal performance in demanding applications. Experience superior efficiency and robust thermal management that enhances device longevity. Ideal for power amplification and RF applications, this transistor empowers your innovations while maximizing value and reliability in every project.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally provide lower on-resistance and higher efficiency, making them suitable for high-speed applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows the FET to operate effectively in digital circuits, enabling better control over current flow.

Maximum Drain Current (Abs) (ID): 16 A

With a maximum drain current of 16 A, this FET can handle substantial loads, making it ideal for power switching applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and lower power consumption, advantageous for battery-operated and portable devices.

Maximum Operating Temperature: 200 °C

The high maximum operating temperature allows this FET to function reliably in extreme environments, enhancing its versatility.

Maximum Drain Current (ID): 16 A

A repeat specification that emphasizes the capability to manage high currents, useful for demanding applications.

Maximum Time At Peak Reflow Temperature (s): 30

Withstanding longer peak reflow temperatures makes this FET suitable for surface-mount technology (SMT) processes.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C ensures compatibility with lead-free soldering processes, important for modern electronics manufacturing.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G22L-40P,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

16 A

Maximum Drain Current (ID):

16 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

BLF6G22L-40P,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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