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BF998R-TAPE-7

NXP Semiconductors

BF998R-TAPE-7 by NXP Semiconductors

BF998R-TAPE-7 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications. It features a dual gate, depletion mode operation with a max drain current of 30 mA and a breakdown voltage of 12 V. Ideal for ultra-high frequency use, it comes in a compact surface mount package.

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3

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1k+

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Anansix

USA . 2,849 parts In-Stock

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Digiode

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Vyrian

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One Stop Electronics

USA . 817 parts In-Stock

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UNI Independent Distributors

Spain . 5,813 parts In-Stock

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Corphita

USA . 3,957 parts In-Stock

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Northwest PG Solutions

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Native Components

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Overview

Unlock unparalleled performance with the BF998R-TAPE-7 from NXP Semiconductors, a leader in innovative RF solutions. This high-quality N-channel FET is expertly designed for amplifying signals in ultra-high frequency applications, ensuring reliability and efficiency. With its compact surface mount package and built-in diode, it offers seamless integration into your projects. Elevate your designs with NXP’s trusted technology, delivering exceptional value and performance you can count on!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides excellent insulation and protects the internal components, ensuring reliability in various environmental conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher electron mobility, making them suitable for efficient amplification applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for protection and improved circuit functionality, making this product ideal for signal processing applications.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET excels in signal enhancement, making it suitable for audio and radio frequency applications.

Surface Mount: YES

Surface mount technology allows for compact designs and automatic assembly, helping to reduce manufacturing costs and improve layout efficiency.

Minimum DS Breakdown Voltage: 12 V

A minimum breakdown voltage of 12 V ensures that the FET can handle a range of voltages, making it versatile for various circuit designs.

Package Shape: RECTANGULAR

The rectangular package shape supports efficient use of board space and better thermal management, which is crucial for high-frequency applications.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and provide mechanical reliability, enhancing the durability of the connection in assembled circuits.

Operating Mode: DUAL GATE, DEPLETION MODE

Dual gate operation allows for finer control of the FET's characteristics, making it suitable for applications requiring precise signal manipulation.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Operating in the ultra-high frequency band makes this FET ideal for RF applications, ensuring optimal performance in communication and broadcasting technologies.

No. of Terminals: 4

With 4 terminals, this FET can be efficiently integrated into various circuits, providing flexible connection options for designers.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for high-density circuit designs, which is often necessary in modern electronics, saving space on printed circuit boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making the FET suitable for power-sensitive applications.

Maximum Operating Temperature: 150 °C

The ability to operate at high temperatures ensures reliability and performance, even in demanding environments, extending the product's lifespan.

Transistor Element Material: SILICON

Silicon is a well-established semiconductor material, offering effective performance and stability, which is crucial for a variety of electronic applications.

Maximum Drain Current (ID): 0.03 A

A maximum drain current of 0.03 A provides adequate power handling capability for small signal applications, ensuring versatility in circuit design.

Terminal Position: DUAL

Dual terminal positioning allows for flexible circuit configurations and enhances ease of integration into diverse electronic designs.

Case Connection: SOURCE

Having the source connected at the case enhances thermal dissipation, improving the stability and performance of the FET in high-power applications.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF998R-TAPE-7 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

12 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, DEPLETION MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF998R-TAPE-7 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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