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BF1201,215

NXP Semiconductors

BF1201,215 by NXP Semiconductors

BF1201,215 by NXP Semiconductors is an N-channel MOSFET designed for efficient power management. It supports a max drain current of 30 mA and power dissipation of 200 mW, operating up to 150 °C. Ideal for surface mount applications in compact electronic devices.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Vyrian

USA . 9,350 parts In-Stock

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Goldney Electronics S.L.

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Anansix

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Digiode

USA . 786 parts In-Stock

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AZTECH Wire

Italy . 1,012 parts In-Stock

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One Stop Electronics

USA . 1,005 parts In-Stock

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UNI Independent Distributors

Spain . 5,763 parts In-Stock

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Corphita

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Northwest PG Solutions

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Microchip USA

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Native Components

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Overview

Elevate your projects with the BF1201,215 from NXP Semiconductors—a trusted leader in innovative technology. This high-quality N-channel Power FET offers exceptional reliability and performance in compact designs, perfect for a range of applications including signal amplification and power management. Enjoy reduced energy consumption and enhanced efficiency, making it the ideal choice for cutting-edge electronics that demand both durability and precision.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their higher electron mobility, which translates to faster switching speeds and better efficiency in various applications.

Configuration: SINGLE

Single configuration provides a straightforward design, making it easy to integrate into various circuits without the complexity of multiple devices.

Surface Mount: YES

Surface mount technology allows for compact designs, enabling space-saving PCB layouts and improved performance in high-density applications.

Maximum Drain Current (Abs) (ID): 0.03 A

With a maximum drain current of 0.03 A, this FET is suitable for low-power applications, ensuring reliability and efficiency without the risk of overheating.

Maximum Power Dissipation (Abs): 0.2 W

A maximum power dissipation of 0.2 W indicates that the device can handle sufficient heat, making it robust for use in various thermal environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides high input impedance and better thermal stability, enhancing performance in digital and analog applications.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature of 150 °C allows for reliable operation in harsh environments, making it versatile for industrial applications.

Terminal Finish: Tin (Sn)

Tin terminal finish offers good solderability and corrosion resistance, ensuring durable connections in various deployment scenarios.

Maximum Drain Current (ID): 0.03 A

Reiterating the maximum drain current, this specification emphasizes the suitability of the FET for applications requiring low current ratings while maintaining efficiency.

Technical Specifications

Power Field Effect Transistors (FET) BF1201,215 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF1201,215 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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