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BF1204,135

NXP Semiconductors

BF1204,135 by NXP Semiconductors

BF1204,135 by NXP Semiconductors is a N-CHANNEL Power FET with dual gate, enhancement mode. It has max drain current of 0.03A and power dissipation of 0.2W. Ideal for applications requiring high temperature tolerance up to 150°C in surface mount configurations.

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5

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1k+

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Vyrian

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Anansix

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Digiode

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Nova Conductors

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AZTECH Wire

Italy . 627 parts In-Stock

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One Stop Electronics

USA . 416 parts In-Stock

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Ampacity Inc.

Singapore . 1,505 parts In-Stock

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UNI Independent Distributors

Spain . 7,293 parts In-Stock

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Kepictronics

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Corphita

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Aranea Global

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Microchip USA

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Overview

Get ready to power up your projects with the BF1204,135 from NXP Semiconductors. As a leader in semiconductor technology, NXP ensures top-notch quality and reliability in their products. The BF1204,135 is a high-performance N-Channel Power Field Effect Transistor suitable for a variety of applications. With dual gate, enhancement mode operating mode, this FET offers maximum efficiency and power dissipation. Trust NXP for cutting-edge technology and exceptional performance. Upgrade your designs today with the BF1204,135!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically offer lower conduction losses and better thermal performance compared to P-Channel FETs, making them a good choice for many applications.

Surface Mount: YES

Surface mount capability allows for easy and space-efficient integration onto circuit boards, enhancing overall design flexibility.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

Dual gate design in enhancement mode enhances the FET's performance in terms of speed, efficiency, and control, making it suitable for high-frequency applications.

Maximum Drain Current (Abs) (ID): 0.03 A

The high maximum drain current rating ensures the FET can handle high current loads without overheating or failing, providing reliability in demanding scenarios.

Maximum Power Dissipation (Abs): 0.2 W

The low maximum power dissipation helps in minimizing heat generation and overall power consumption, enhancing efficiency and longevity of the FET.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers improved switching speed, lower power consumption, and better reliability compared to other FET technologies, making it a preferred choice for various applications.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature range allows the FET to operate reliably in high-temperature environments without performance degradation, ensuring stable operation under varying conditions.

Terminal Finish: Tin (Sn)

Tin terminal finish provides good solderability, corrosion resistance, and electrical conductivity, ensuring secure connections and long-term reliability in the circuit.

Technical Specifications

Power Field Effect Transistors (FET) BF1204,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF1204,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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