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BF1215,115

NXP Semiconductors

BF1215,115 by NXP Semiconductors

BF1215,115 by NXP Semiconductors is an N-channel MOSFET designed for efficient power management. It features a max drain current of 30 mA, power dissipation of 180 mW, and operates up to 150 °C. Ideal for dual-gate applications in compact electronic devices.

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3

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1k+

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Vyrian

USA . 4,815 parts In-Stock

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Digiode

USA . 3,126 parts In-Stock

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Anansix

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Native Components

USA . 418 parts In-Stock

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Northwest PG Solutions

USA . 426 parts In-Stock

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$0.089

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AZTECH Wire

Italy . 1,128 parts In-Stock

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One Stop Electronics

USA . 987 parts In-Stock

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Component Stockers USA

USA . 391 parts In-Stock

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$99.990

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QUARKTWIN TECHNOLOGY LTD

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UNI Independent Distributors

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Microchip USA

USA . 2,910 parts In-Stock

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Perfect Parts

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Corphita

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Overview

Elevate your designs with the BF1215,115 from NXP Semiconductors—the trusted name in innovative electronic solutions. This N-channel Power FET combines reliability and efficiency, making it ideal for a variety of applications such as RF amplification and signal processing. With superior thermal performance and dual-gate enhancement mode, it ensures optimal operation even in demanding environments. Choose BF1215,115 for its exceptional quality and experience unmatched value in your projects!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher electron mobility, resulting in better performance and efficiency, making them an ideal choice for various applications.

Surface Mount: YES

Surface mount capability allows for efficient manufacturing processes and saves space on circuit boards, making this FET suitable for compact designs.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

The dual gate enhancement mode provides greater versatility in applications such as RF amplifiers and mixers, allowing for improved signal performance.

Maximum Drain Current (Abs) (ID): 0.03 A

A maximum drain current of 0.03 A is suitable for low-power applications, ensuring safe operation without overwhelming the device.

Maximum Power Dissipation (Abs): 0.18 W

With a maximum power dissipation of 0.18 W, this FET is suitable for low-power designs, ensuring efficient operation without generating excessive heat.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The MOS technology enhances speed and reduces power consumption, making this FET an excellent choice for high-performance applications.

Maximum Operating Temperature: 150 °C

A high operating temperature limit of 150 °C ensures reliability and performance in demanding environments, making this FET suitable for various industrial applications.

Maximum Drain Current (ID): 0.03 A

The specification is reiterated to emphasize its appropriateness for low power applications, providing consistent performance in circuit design.

Technical Specifications

Power Field Effect Transistors (FET) BF1215,115 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

BF1215,115 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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