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BF1217WR,115

NXP Semiconductors

BF1217WR,115 by NXP Semiconductors

BF1217WR,115 by NXP Semiconductors is an N-channel FET designed for efficient power management. It features a max drain current of 30 mA, power dissipation of 180 mW, and operates at up to 150 °C. Ideal for dual-gate applications in compact electronic devices.

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Chip1Stop

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Digiode

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Native Components

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Northwest PG Solutions

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AZTECH Wire

Italy . 162 parts In-Stock

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Ampacity Inc.

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QUARKTWIN TECHNOLOGY LTD

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Overview

Elevate your designs with the BF1217WR,115 from NXP Semiconductors—your go-to choice for top-tier power performance! This N-channel FET offers exceptional reliability and efficiency, making it ideal for a variety of applications. With NXP's legacy of innovation and quality, you can trust that this transistor will enhance your projects while delivering superior thermal management. Choose the BF1217WR,115 and experience a boost in performance and dependability today!

Feature Benefit Bullets

Polarity/Channel Type: N-CHANNEL

N-channel FETs are known for their higher electron mobility, making them capable of switching faster and handling higher currents, which is advantageous for high-speed applications.

Configuration: SINGLE

A single FET configuration simplifies circuit design and reduces component count, making it easier to implement in various electronic applications.

Surface Mount: YES

Surface mount technology allows for compact designs and automated assembly, leading to improved manufacturing efficiency and reduced space requirements on PCBs.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

The dual gate enhancement mode allows for better control of the channel conductivity, improving performance in RF and analog applications due to better linearity and reduced distortion.

Maximum Drain Current (Abs): 0.03 A

With a maximum drain current of 0.03 A, this FET is suitable for low-power applications, providing efficiency and reliability in devices where current limits are critical.

Maximum Power Dissipation (Abs): 0.18 W

A maximum power dissipation of 0.18 W indicates that the FET can handle low power without overheating, making it a safe choice for compact and heat-sensitive circuits.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology results in low power consumption and high input impedance, making this FET ideal for battery-operated devices and reducing loading effects in circuits.

Maximum Operating Temperature: 150 °C

The ability to operate at high temperatures (up to 150 °C) ensures reliability in high-temperature environments, broadening the range of applications for this FET.

Maximum Drain Current (ID): 0.03 A

Reiterating the low maximum drain current capability, this further emphasizes its suitability for low-power and portable electronic devices.

Technical Specifications

Power Field Effect Transistors (FET) BF1217WR,115 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

BF1217WR,115 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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