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BF1211WR,135

NXP Semiconductors

BF1211WR,135 by NXP Semiconductors

BF1211WR,135 by NXP Semiconductors is an N-channel FET designed for surface mount applications. It features a max drain current of 30 mA, power dissipation of 180 mW, and operates at up to 150 °C. Ideal for dual gate enhancement mode circuits in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Anansix

USA . 2,727 parts In-Stock

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Digiode

USA . 1,070 parts In-Stock

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Vyrian

USA . 100 parts In-Stock

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100

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Native Components

USA . 805 parts In-Stock

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$0.803

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Northwest PG Solutions

USA . 1,827 parts In-Stock

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$0.884

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One Stop Electronics

USA . 683 parts In-Stock

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$44.050

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Corphita

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UNI Independent Distributors

Spain . 769 parts In-Stock

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Overview

Unlock the potential of your designs with the BF1211WR,135 from NXP Semiconductors, a leader in innovative technology. This high-quality N-channel power FET delivers superior performance with its dual-gate enhancement mode, making it ideal for a variety of applications—from RF amplification to signal switching. Experience unmatched reliability and efficiency that enhances your devices, ensuring they run smoothly even in demanding environments. Elevate your projects with NXP’s trusted expertise!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally characterized by lower on-resistance and faster switching speeds, making them ideal for various applications.

Configuration: SINGLE

Single configuration simplifies design and integration in circuits, reducing complexity and potential points of failure.

Surface Mount: YES

Surface mount technology allows for better space efficiency on PCBs and enables automated assembly processes.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

Enhancement mode operation provides the ability to completely turn off the transistor, which improves switching performance and efficiency.

Maximum Drain Current (Abs) (ID): 0.03 A

With a maximum drain current of 0.03 A, this FET is suitable for low-current applications, ensuring effective operation without thermal overload.

Maximum Power Dissipation (Abs): 0.18 W

A maximum power dissipation of 0.18 W indicates that this FET can handle power efficiently, which is crucial for maintaining reliability in circuit designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology is known for its high input impedance and low static power consumption, making this FET ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

A high operating temperature of 150 °C ensures reliable performance in demanding environments and applications requiring robust thermal management.

Terminal Finish: Tin (Sn)

Tin finish provides good solderability and corrosion resistance, enhancing the durability and longevity of the component in various applications.

Technical Specifications

Power Field Effect Transistors (FET) BF1211WR,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF1211WR,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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