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BF1212WR,135

NXP Semiconductors

BF1212WR,135 by NXP Semiconductors

BF1212WR,135 by NXP Semiconductors is an N-channel FET designed for surface mount applications. It features a max drain current of 30 mA, power dissipation of 180 mW, and operates at up to 150 °C. Ideal for dual gate enhancement mode circuits in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Anansix

USA . 2,848 parts In-Stock

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Digiode

USA . 2,437 parts In-Stock

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Vyrian

USA . 90 parts In-Stock

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90

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Native Components

USA . 451 parts In-Stock

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$0.899

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451

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Northwest PG Solutions

USA . 400 parts In-Stock

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$0.989

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One Stop Electronics

USA . 1,374 parts In-Stock

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$56.050

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UNI Independent Distributors

Spain . 5,728 parts In-Stock

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Corphita

USA . 4,452 parts In-Stock

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Overview

Experience unparalleled performance with the BF1212WR,135 from NXP Semiconductors—renowned for their commitment to quality and innovation. This N-channel power FET is designed for efficiency and reliability, making it ideal for a wide range of applications including amplifiers and switching circuits. With its dual-gate enhancement mode, you gain superior control over your power management needs. Elevate your projects with a trusted solution that ensures robust operation even in demanding environments!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally favored for their higher electron mobility, which leads to better performance in high-speed applications.

Configuration: SINGLE

A single configuration simplifies the circuit design, making it easier to integrate into various applications.

Surface Mount: YES

Surface mount capability allows for a compact design, making it ideal for space-constrained applications and facilitating automated assembly.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

The enhancement mode provides better control of the conduction channel, allowing for improved switching performance in logic devices.

Maximum Drain Current (Abs) (ID): 0.03 A

A maximum drain current of 0.03 A makes this FET suitable for low-power applications while ensuring adequate performance in the specified range.

Maximum Power Dissipation (Abs): 0.18 W

With a maximum power dissipation of 0.18 W, this FET efficiently manages heat, ensuring reliability in various operating conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET efficient for digital applications.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C ensures reliable operation in challenging environments, making it versatile for industrial applications.

Terminal Finish: Tin (Sn)

Tin finish provides excellent solderability and corrosion resistance, ensuring long-lasting connections in electronic assemblies.

Maximum Drain Current (ID): 0.03 A

This specification reiterates the suitability of the product for low-power circuits, enhancing design flexibility while maintaining performance.

Technical Specifications

Power Field Effect Transistors (FET) BF1212WR,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF1212WR,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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