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STD7NM50N-1

STMicroelectronics

STD7NM50N-1 by STMicroelectronics

STD7NM50N-1 by STMicroelectronics is an N-channel FET designed for switching applications. It features a 500V breakdown voltage, 20A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic circuits.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 3,405 parts In-Stock

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3,405

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Digiode

USA . 475 parts In-Stock

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475

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Anansix

USA . 455 parts In-Stock

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455

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 143 parts In-Stock

1+ parts

$0.599

100+ parts

-

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$0.539

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143

$0.599

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$0.539

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MKK Technologies

India . 361 parts In-Stock

1+ parts

$1.126

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361

$1.126

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DigiPath Technology Company

USA . 361 parts In-Stock

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$1.126

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361

$1.126

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Ampacity Inc.

Singapore . 735 parts In-Stock

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$12.050

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735

$12.050

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AZTECH Wire

Italy . 172 parts In-Stock

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$20.160

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172

$20.160

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Corphita

USA . 4,163 parts In-Stock

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4,163

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Alle Elektronik GmbH

Germany . 3,438 parts In-Stock

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3,438

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Parana Technologies

USA . 1,921 parts In-Stock

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$0.716

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1,921

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$0.716

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Kepictronics

USA . 1,000 parts In-Stock

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1,000

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Overview

Unlock the power of efficiency with the STD7NM50N-1 from STMicroelectronics, a leader in semiconductor innovation. This robust N-channel Power FET excels in high-voltage switching applications, ensuring reliability and superior performance. With built-in diode functionality, it simplifies your designs while maximizing energy savings. Experience exceptional quality and versatility in every project, making it the perfect choice for both industrial and consumer electronics. Elevate your applications today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures durability and environmental resistance, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have higher efficiency and faster switching speeds, making them a good choice for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances protection against voltage spikes and helps to simplify circuit design.

Transistor Application: SWITCHING

This FET is specifically designed for switching applications, making it ideal for power management in electronic devices.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage allows for reliable performance in high-voltage applications, ensuring safety and efficacy.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient space utilization on PCBs, allowing for more compact circuit designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals ensure a strong mechanical connection and ease of soldering, making assembly straightforward.

Operating Mode: ENHANCEMENT MODE

Enhancement mode provides improved performance characteristics, allowing for better control of the FET during operation.

Maximum Pulsed Drain Current (IDM): 20 A

The capability to handle high pulsed currents enhances the FET's performance in dynamic applications.

Avalanche Energy Rating (EAS): 100 mJ

A high avalanche energy rating contributes to the reliability of the FET in conditions where voltage transients may occur.

Maximum Drain Current (Abs) (ID): 5 A

The FET's ability to manage a significant drain current makes it suitable for various demanding applications.

No. of Terminals: 3

Three terminals provide a straightforward configuration that simplifies circuit design and integration.

Maximum Power Dissipation (Abs): 45 W

High power dissipation capacity means that it can handle significant power loads without overheating.

Package Style (Meter): IN-LINE

The in-line package style offers efficient space management, suitable for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances the FET's performance characteristics, leading to better efficiency and lower power consumption.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows for reliable operation in environments that may experience significant heat.

Transistor Element Material: SILICON

Silicon is a well-established material for transistors, ensuring stability, performance, and reliability.

Maximum Drain Current (ID): 5 A

The consistent maximum drain current rating signifies robust performance for various power applications.

Maximum Drain-Source On Resistance: 0.78 ohm

Low on-resistance minimizes power loss during operation, enhancing overall system efficiency.

Terminal Position: SINGLE

A single terminal position simplifies the integration process into circuits, making it easier to design and install.

Technical Specifications

Power Field Effect Transistors (FET) STD7NM50N-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

100 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

5 A

Maximum Drain Current (ID):

5 A

Maximum Drain-Source On Resistance:

.78 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251AA

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

20 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD7NM50N-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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