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PD84006-E

STMicroelectronics

PD84006-E by STMicroelectronics

PD84006-E by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 5 A, a breakdown voltage of 25 V, and operates in the ultra-high frequency band. This compact device supports surface mount technology with a max temp of 165 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 5,433 parts In-Stock

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Anansix

USA . 2,561 parts In-Stock

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2,561

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Digiode

USA . 1,019 parts In-Stock

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1,019

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Lakeland Logistics Inc

USA . 400 parts In-Stock

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400

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Bristol Electronics

USA . 400 parts In-Stock

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400

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 925 parts In-Stock

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$1.784

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$1.605

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925

$1.784

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$1.605

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MKK Technologies

India . 2,079 parts In-Stock

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$3.354

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DigiPath Technology Company

USA . 2,079 parts In-Stock

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$3.354

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2,079

$3.354

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AZTECH Wire

Italy . 352 parts In-Stock

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$20.450

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Corphita

USA . 2,848 parts In-Stock

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Parana Technologies

USA . 2,153 parts In-Stock

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$2.133

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Perfect Parts

USA . 202 parts In-Stock

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Overview

Experience unmatched performance with the PD84006-E by STMicroelectronics, a leading name in RF Power FET technology. This N-channel transistor promises superior amplification for ultra-high frequency applications, ensuring reliable operation even in demanding environments. Its compact design and robust construction make it an ideal choice for various electronic projects, offering you exceptional value, enhanced durability, and efficiency that drive your innovations forward.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material offers durability and thermal stability, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for higher electron mobility, allowing for lower on-resistance and better performance in amplifying applications.

Configuration: SINGLE

Single configuration provides simplicity in design and ease of integration into circuits.

Transistor Application: AMPLIFIER

Designed for amplification, this FET is ideal for use in RF circuits requiring signal boost.

Surface Mount: YES

Surface mount capability allows for smaller PCB designs and more efficient use of space in modern electronics.

Minimum DS Breakdown Voltage: 25 V

A minimum breakdown voltage of 25V ensures reliability in high-voltage applications.

Package Shape: RECTANGULAR

The rectangular package shape is conducive to a compact footprint, making it easier to assemble on PCBs.

Terminal Form: GULL WING

Gull wing terminals facilitate easier soldering and improve mechanical stability on the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows the FET to be turned on or off, providing better control in applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capability to operate in the ultra-high frequency band makes it suitable for advanced RF communication systems.

Maximum Drain Current (Abs) (ID): 5 A

5A maximum drain current allows this FET to drive substantial loads effectively.

No. of Terminals: 2

A two-terminal design streamlines connections and simplifies circuit integration.

Maximum Power Dissipation (Abs): 59 W

With a maximum power dissipation of 59W, this FET is robust enough to handle demanding applications.

Package Style (Meter): SMALL OUTLINE

A small outline package style is ideal for compact designs, enabling space-saving solutions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures high input impedance and low static power consumption.

Maximum Operating Temperature: 165 °C

A high operating temperature of 165 °C allows this FET to function in extreme conditions without failure.

Transistor Element Material: SILICON

Silicon material offers excellent thermal and electrical properties, ensuring reliability and performance.

Terminal Finish: MATTE TIN

Matte tin finish enhances solderability and helps prevent oxidation, ensuring reliable connections.

Maximum Drain Current (ID): 5 A

This specification is reiterated to emphasize the FET's ability to support high drain currents effectively.

Terminal Position: DUAL

Dual terminal position enhances layout flexibility and provides ease of routing in PCB designs.

Moisture Sensitivity Level (MSL): 3

An MSL of 3 indicates a moderate sensitivity, advising proper handling to avoid moisture-related issues.

Case Connection: SOURCE

Source connection ensures optimal performance and heat dissipation in high-current applications.

Maximum Time At Peak Reflow Temperature (s): 30

Allows for a controlled soldering process, enhancing the reliability of the assembly.

Peak Reflow Temperature °C: 250

A peak reflow temperature of 250 °C ensures compatibility with lead-free soldering processes, addressing environmental regulations.

Technical Specifications

RF Power Field Effect Transistors (FET) PD84006-E attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

HIGH RELIABILITY

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

25 V

Maximum Drain Current (Abs) (ID):

5 A

Maximum Drain Current (ID):

5 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

250

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD84006-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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