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NTZD3154NT2H

Onsemi

NTZD3154NT2H by Onsemi

NTZD3154NT2H by Onsemi is a N-CHANNEL FET with 20V DS Breakdown Voltage, 0.54A Drain Current, and 0.55 ohm On Resistance. Ideal for SWITCHING applications, it features a RECTANGULAR package shape, METAL-OXIDE SEMICONDUCTOR technology, and operates at up to 150 °C.

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1k+

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Digiode

USA . 1,929 parts In-Stock

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SupplyDigital Components

Austria . 7,414 parts In-Stock

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TANS Electronics

Latvia . 6,682 parts In-Stock

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Problanco Electronics

Mexico . 4,943 parts In-Stock

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Kulean Microsystems

USA . 2,794 parts In-Stock

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Corphita

USA . 745 parts In-Stock

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UHIMA Technologies

Türkiye . 190 parts In-Stock

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Corohmni

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Overview

Discover the NTZD3154NT2H by Onsemi, a top-quality small signal field-effect transistor that offers reliable performance and versatility for various switching applications. With its N-channel configuration and built-in diode, this transistor provides seamless operation and enhanced efficiency. Suitable for surface mount installations, this transistor boasts a maximum power dissipation of 0.25 W and a minimum DS breakdown voltage of 20 V. Trust in Onsemi's expertise in semiconductor technology to deliver a product that meets your needs and exceeds your expectations. Choose the NTZD3154NT2H for superior performance and value in your electronic projects.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package material offers good insulation and protection for the transistor, ensuring reliability in various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have higher mobility and faster switching speeds compared to P-channel transistors, making them suitable for switching applications.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

The built-in diode allows for easier circuit design and protection against reverse current flow, enhancing the overall efficiency and reliability of the transistor.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor offers fast switching speeds and low on-resistance, making it ideal for use in electronic circuits that require rapid switching.

Surface Mount: YES

Surface mount technology allows for easier and more efficient assembly of electronic circuits, saving space and reducing production costs.

Minimum DS Breakdown Voltage: 20 V

The minimum breakdown voltage of 20V ensures that the transistor can handle moderate voltage levels safely, making it suitable for a variety of applications.

Package Shape: RECTANGULAR

The rectangular package shape allows for easy placement and soldering on circuit boards, enhancing the overall manufacturability of the product.

Terminal Form: FLAT

Flat terminals provide a stable and secure connection, ensuring reliable electrical contact and preventing damage during assembly and operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors offer high input impedance and low leakage current, making them easy to control and energy-efficient in operation.

No. of Elements: 2

Having 2 elements allows for more versatile circuit designs and applications, providing greater flexibility in electronic system integration.

Maximum Drain Current (Abs) (ID): 0.54 A

The maximum drain current rating of 0.54A ensures that the transistor can handle moderate current levels without overheating or failing prematurely.

No. of Terminals: 6

Having 6 terminals provides ample connection points for external components, enabling more complex circuit configurations and functionality.

Maximum Power Dissipation (Abs): 0.25 W

The maximum power dissipation of 0.25W indicates the amount of heat the transistor can safely dissipate, ensuring reliable operation under varying load conditions.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the circuit board, allowing for denser component placement and more compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high switching speeds, low on-resistance, and low power consumption, making it ideal for various electronic applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this transistor can withstand high-temperature environments, ensuring reliable performance in demanding conditions.

Transistor Element Material: SILICON

Silicon transistors are widely used for their high reliability, thermal stability, and compatibility with modern semiconductor processes, ensuring long-term performance.

Terminal Finish: TIN

Tin terminal finish provides good solderability and corrosion resistance, ensuring reliable electrical connections and longevity in various operating environments.

Maximum Drain-Source On Resistance: 0.55 ohm

The low on-resistance of 0.55 ohm minimizes power loss and heat generation in the transistor, improving overall efficiency and performance in switching applications.

Terminal Position: DUAL

Dual terminal position provides flexibility in circuit layout and connectivity, allowing for different mounting orientations and configurations to suit specific application requirements.

Maximum Time At Peak Reflow Temperature (s): 30

With a maximum time at peak reflow temperature of 30 seconds, this transistor can withstand typical soldering processes without damage, ensuring reliable assembly.

Peak Reflow Temperature °C: 260

The peak reflow temperature of 260 °C indicates the maximum temperature the transistor can withstand during soldering processes, ensuring proper bonding and connectivity.

Maximum Feedback Capacitance (Crss): 20 pF

The low feedback capacitance of 20 pF minimizes signal distortion and interference in high-frequency applications, ensuring clean and accurate signal processing.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTZD3154NT2H attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

.54 A

Maximum Drain Current (ID):

.54 A

Maximum Drain-Source On Resistance:

.55 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

20 pF

JESD-30 Code:

R-PDSO-F6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTZD3154NT2H Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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