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NTZD3152PT5G

Onsemi

NTZD3152PT5G by Onsemi

NTZD3152PT5G by Onsemi is a P-CHANNEL FET with 20V DS Breakdown Voltage, 0.43A ID, and 0.9 ohm RDS(ON). It is used for SWITCHING applications in ENHANCEMENT MODE. This SMALL OUTLINE transistor has 2 elements with built-in diode and operates in METAL-OXIDE SEMICONDUCTOR technology.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 8,051 parts In-Stock

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Digiode

USA . 1,256 parts In-Stock

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AZTECH Wire

Italy . 1,017 parts In-Stock

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$9.700

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TANS Electronics

Latvia . 6,281 parts In-Stock

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Kulean Microsystems

USA . 4,328 parts In-Stock

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SupplyDigital Components

Austria . 1,354 parts In-Stock

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Problanco Electronics

Mexico . 1,202 parts In-Stock

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Corphita

USA . 1,061 parts In-Stock

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Corohmni

South Africa . 261 parts In-Stock

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UHIMA Technologies

Türkiye . 16 parts In-Stock

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Overview

Upgrade your electronic devices with the NTZD3152PT5G from Onsemi, a leading manufacturer known for superior quality and reliability. This P-CHANNEL small signal Field Effect Transistor (FET) with built-in diode is perfect for switching applications. With its high performance and efficiency, this transistor offers unmatched value and benefits to customers looking to enhance their products. Trust Onsemi for cutting-edge technology that delivers exceptional results every time.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good insulation and protection for the internal components, ensuring durability and reliability.

Polarity or Channel Type: P-CHANNEL

Allows for efficient switching and control of current flow in the device.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

Offers versatility in circuit design and usage with built-in diode for added functionality.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring optimal performance in such scenarios.

Surface Mount: YES

Enables easy and efficient mounting on circuit boards, saving space and facilitating automated assembly processes.

Minimum DS Breakdown Voltage: 20 V

Provides a safe operating range for the transistor, protecting it from voltage spikes or surges.

Package Shape: RECTANGULAR

Helps in easy and compact placement of the transistor on the circuit board.

Terminal Form: FLAT

Facilitates secure and stable connections during installation and use.

Operating Mode: ENHANCEMENT MODE

Enhances control over the transistor's conduction, allowing for precise switching and power management.

No. of Elements: 2

Dual elements provide increased functionality and options for circuit design and control.

No. of Terminals: 6

Offers multiple connection points for different circuit configurations and requirements.

Package Style (Meter): SMALL OUTLINE

Compact design saves space and allows for efficient placement in small electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Delivers high performance and reliability in signal amplification and switching applications.

Transistor Element Material: SILICON

Known for its stability and efficiency in electronic components, ensuring long-term functionality.

Terminal Finish: TIN

Provides good conductivity and protection against corrosion, ensuring reliable connections.

Maximum Drain Current (ID): 0.43 A

Capable of handling moderate current loads, suitable for various electronic applications.

Maximum Drain-Source On Resistance: 0.9 ohm

Low resistance allows for efficient current flow, reducing power loss and heat generation.

Terminal Position: DUAL

Dual terminals offer flexibility in connection options and circuit configurations.

Peak Reflow Temperature °C: 260

Resistant to high temperatures during manufacturing processes like soldering and reflow, ensuring reliability.

Maximum Feedback Capacitance (Crss): 20 pF

Low feedback capacitance minimizes signal distortion and interference, ensuring clean and accurate output.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTZD3152PT5G attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

ESD PROTECTION, LOW THRESHOLD

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

.43 A

Maximum Drain-Source On Resistance:

.9 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

20 pF

JESD-30 Code:

R-PDSO-F6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTZD3152PT5G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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