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NTZD3152PT5H

Onsemi

NTZD3152PT5H by Onsemi

NTZD3152PT5H by Onsemi is a P-CHANNEL FET with 20V DS Breakdown Voltage, 0.43A ID, and 0.9 ohm RDS(ON). Ideal for SWITCHING applications, it features 2 elements with built-in diode in a small outline package suitable for surface mount technology.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 2,055 parts In-Stock

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Vyrian

USA . 441 parts In-Stock

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Kulean Microsystems

USA . 6,669 parts In-Stock

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SupplyDigital Components

Austria . 5,276 parts In-Stock

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TANS Electronics

Latvia . 5,170 parts In-Stock

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Corphita

USA . 2,201 parts In-Stock

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Corohmni

South Africa . 355 parts In-Stock

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UHIMA Technologies

Türkiye . 199 parts In-Stock

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Problanco Electronics

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Overview

Unlock the power of cutting-edge technology with the NTZD3152PT5H by Onsemi. Crafted with precision and expertise, this P-channel Small Signal Field Effect Transistor is designed for high-performance switching applications. With a compact package body material and built-in diode elements, this transistor offers unparalleled efficiency and reliability. Experience seamless operation and superior functionality with Onsemi's innovative design. Trust NTZD3152PT5H to deliver exceptional results for all your electronic needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/Epoxy material provides good protection to the internal components of the transistor and ensures durability.

Polarity or Channel Type: P-CHANNEL

P-Channel type allows for efficient switching, making this transistor suitable for various applications.

Transistor Application: SWITCHING

Designed for switching applications, this transistor can quickly turn on and off, making it ideal for digital circuits.

Minimum DS Breakdown Voltage: 20 V

With a minimum breakdown voltage of 20V, this transistor can handle higher voltages, increasing its application range.

Surface Mount: YES

Surface mount technology simplifies the PCB assembly process and saves space, making this transistor suitable for compact electronic devices.

Maximum Drain Current (ID): 0.43 A

Capable of handling a maximum drain current of 0.43A, this transistor can be used in low to moderate power applications.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTZD3152PT5H attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

ESD PROTECTION, LOW THRESHOLD

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

.43 A

Maximum Drain-Source On Resistance:

.9 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

20 pF

JESD-30 Code:

R-PDSO-F6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTZD3152PT5H Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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