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NTZD5110NT1G

Onsemi

NTZD5110NT1G by Onsemi

NTZD5110NT1G by Onsemi is a N-CHANNEL FET with 2 elements & built-in diode for SWITCHING applications. Features include 60V DS Breakdown Voltage, 0.294A Drain Current, and 1.6 ohm Drain-Source Resistance. Operates in ENHANCEMENT MODE at max temp of 150°C, ideal for small outline packages requiring high power dissipation.

Median Price

$0.234

Lifecycle Status

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21

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1k+

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Mouser Electronics

USA . 148,390 parts In-Stock

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$0.360

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$0.137

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$0.098

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148,390

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$0.137

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DigiKey

USA . 15,822 parts In-Stock

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$0.410

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Arrow

USA . 12,000 parts In-Stock

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Rochester

USA . 5,506 parts In-Stock

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$0.078

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Chip1Stop

Japan . 3,527 parts In-Stock

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$0.108

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3,527

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Distributors (In-Stock)

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Digiode

USA . 772 parts In-Stock

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TME

Poland . 1,700 parts In-Stock

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$0.090

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$0.081

1,700

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$0.117

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Nova Conductors

Japan . 25 parts In-Stock

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Chip Stock

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IBS Electronics

USA . 16,000 parts In-Stock

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NAC Semi

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Sensible Micro Corp

USA . 5,119 parts In-Stock

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ComSIT Distribution GmbH

Germany . 3,839 parts In-Stock

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Inventory MP

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Bristol Electronics

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A2Z Electronics, Inc.

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Semicontronic

India . 43,235 parts In-Stock

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$0.050

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$0.049

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$0.048

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Ampacity Inc.

Singapore . 48,155 parts In-Stock

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Corphita

USA . 1,183 parts In-Stock

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Component Stockers USA

USA . 324,384 parts In-Stock

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324,384

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Corohmni

South Africa . 431 parts In-Stock

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Continental Prestige Electronics

USA . 6,949 parts In-Stock

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Argo Parts USA

USA . 3,868 parts In-Stock

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Modulus Dynamics

Lithuania . 13,186 parts In-Stock

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Advanced Electronics

New Zealand . 200 parts In-Stock

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Aztec Data Supply Inc.

USA . 698 parts In-Stock

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Netroflash

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$0.930

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Benley Electronics

USA . 8 parts In-Stock

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Perfect Parts

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Authorized Procurement Solutions

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Microchip USA

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UHIMA Technologies

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Overview

Discover the NTZD5110NT1G by Onsemi, a top-quality Small Signal Field Effect Transistor perfect for switching applications. Manufactured with precision and expertise, this N-CHANNEL transistor offers enhanced performance and reliability. With a maximum power dissipation of 0.25W and a minimum DS breakdown voltage of 60V, this transistor is designed to meet your needs seamlessly. Whether you're working on industrial automation, consumer electronics, or automotive applications, the NTZD5110NT1G provides the value, benefits, and advantages you seek in a high-quality component. Experience the difference with Onsemi's exceptional product today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation and protection for the internal components of the transistor, ensuring reliable long-term performance.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have lower on-resistance and higher mobility compared to P-channel transistors, making them more efficient for switching applications.

Minimum DS Breakdown Voltage: 60 V

With a high breakdown voltage, this transistor is suitable for applications where high voltage switching is required.

Maximum Power Dissipation (Abs): 0.25 W

This transistor has a low power dissipation, making it energy efficient and reducing the need for heat sinks.

Transistor Element Material: SILICON

Silicon is a common and reliable semiconductor material that ensures good performance and stability for the transistor.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTZD5110NT1G attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

.294 A

Maximum Drain Current (ID):

.294 A

Maximum Drain-Source On Resistance:

1.6 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-F6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTZD5110NT1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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