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NTMSD3P102R2G

Onsemi

NTMSD3P102R2G by Onsemi

NTMSD3P102R2G by Onsemi is a P-CHANNEL FET with 20V DS Breakdown Voltage and 2.34A Drain Current. Ideal for SWITCHING applications, it features a SINGLE configuration with BUILT-IN DIODE in a PLASTIC/EPOXY package. Operating at up to 150 °C, this MOSFET has 0.085 ohm On Resistance and 135pF Feedback Capacitance.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Vyrian

USA . 6,998 parts In-Stock

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Digiode

USA . 61 parts In-Stock

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AZTECH Wire

Italy . 368 parts In-Stock

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$10.200

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Problanco Electronics

Mexico . 8,376 parts In-Stock

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SupplyDigital Components

Austria . 7,806 parts In-Stock

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Kulean Microsystems

USA . 6,837 parts In-Stock

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TANS Electronics

Latvia . 2,774 parts In-Stock

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Corphita

USA . 2,488 parts In-Stock

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UHIMA Technologies

Türkiye . 657 parts In-Stock

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Corohmni

South Africa . 320 parts In-Stock

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Overview

Elevate your electronic designs with the NTMSD3P102R2G by Onsemi. Crafted with precision and expertise, this P-Channel Small Signal FET offers unparalleled performance in switching applications. With a maximum drain current of 2.34 A and low on-resistance, this transistor delivers efficient power management. Its compact design, surface-mount capability, and built-in diode make it a versatile choice for various projects. Trust Onsemi's reputation for quality and reliability, and experience the value and benefits this FET brings to your creations. Choose excellence with the NTMSD3P102R2G.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation and protection for the transistor, ensuring durability and reliability.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low RDS(on) values, making them efficient for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET provides fast switching speeds and low power dissipation.

Minimum DS Breakdown Voltage: 20 V

With a breakdown voltage of 20V, this FET can handle higher voltages without breakdown, making it suitable for a variety of applications.

Maximum Drain Current (ID): 2.34 A

With a high drain current rating, this FET can handle higher current loads without overheating, making it reliable for various applications.

Maximum Power Dissipation: 2 W

With a high power dissipation rating, this FET can handle higher power levels without thermal issues, ensuring reliability in operation.

Maximum Operating Temperature: 150 °C

With a high operating temperature range, this FET can withstand elevated temperatures without performance degradation, making it suitable for harsh environments.

Maximum Feedback Capacitance (Crss): 135 pF

This low feedback capacitance helps in reducing signal distortion and improving overall performance in high-frequency applications.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTMSD3P102R2G attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

2.34 A

Maximum Drain Current (ID):

2.34 A

Maximum Drain-Source On Resistance:

.085 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

135 pF

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

2 W

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMSD3P102R2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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