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NTMKB4896NT3G

Onsemi

NTMKB4896NT3G by Onsemi

NTMKB4896NT3G by Onsemi is a N-CHANNEL FET with 30V DS Breakdown Voltage, ideal for SWITCHING applications. It features 140A IDM and 0.012 ohm Drain-Source Resistance, operating in ENHANCEMENT MODE. This METAL-OXIDE SEMICONDUCTOR device has a max temperature of 150 °C and comes in CHIP CARRIER package style.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,029 parts In-Stock

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Vyrian

USA . 581 parts In-Stock

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SupplyDigital Components

Austria . 4,135 parts In-Stock

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Problanco Electronics

Mexico . 3,453 parts In-Stock

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Corphita

USA . 2,375 parts In-Stock

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TANS Electronics

Latvia . 1,919 parts In-Stock

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Kulean Microsystems

USA . 991 parts In-Stock

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UHIMA Technologies

Türkiye . 414 parts In-Stock

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Corohmni

South Africa . 312 parts In-Stock

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Overview

Unlock the power of innovation with the NTMKB4896NT3G by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power FETs that are perfect for switching applications. With a built-in diode and N-CHANNEL configuration, this transistor offers enhanced performance and reliability. Whether you're looking to optimize your circuit design or improve efficiency, the NTMKB4896NT3G provides the value and benefits you need. Trust Onsemi to deliver cutting-edge technology that meets your requirements and exceeds your expectations. Elevate your projects with the NTMKB4896NT3G and experience the difference today.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are commonly used in applications where high switching speed and low on-state resistance are required, making this product suitable for efficient power management.

Minimum DS Breakdown Voltage: 30V

The high breakdown voltage ensures the FET can handle higher voltages without breakdown, making it suitable for various high-power applications.

Maximum Pulsed Drain Current (IDM): 140A

With a high pulsed drain current rating, this FET can handle momentary high-current pulses effectively, making it suitable for applications with intermittent high-power demands.

Package Style: CHIP CARRIER

The chip carrier package style allows for easy mounting on circuit boards, making it suitable for compact designs where space is limited.

Maximum Operating Temperature: 150 °C

Being able to operate at up to 150 °C makes this FET suitable for applications where high temperature tolerance is required, ensuring reliability in harsh environments.

Technical Specifications

Power Field Effect Transistors (FET) NTMKB4896NT3G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

149 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

13 A

Maximum Drain-Source On Resistance:

.012 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XBCC-N2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

CHIP CARRIER

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

140 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

NO LEAD

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMKB4896NT3G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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